Beijing Naura Microelectronics Equipment Co., Ltd.

Shandong Landsee Genetics Co., Ltd.

Kui Xu

Lei Zhu

Peng Chen

Hao Guo

Peijun Ding

Mengxin Zhao

Kui Li

Yulian Mu

Qing She

Guodong Bian

Zhiguo Liu

Yang Qiu

Julang Li

Yinghui Wei

Changli Ge

Xuehui Cai

Long Wang

Qimei Chen

The invention provides a collection assembly and a semiconductor pre-cleaning chamber, which relate to the semiconductor processing apparatus field. The collection assembly is configured to collect particle impurities in the semiconductor pre-cleaning chamber, and includes a protection plate and a collection plate arranged at an interval in the semiconductor pre-cleaning chamber. The protection plate is annular. A plurality of first through-holes are arranged at the protection plate and configured for the process gas in the semiconductor pre-cleaning chamber to pass through. The collection plate is located on a side of an air outlet end of the first through-holes and configured to capture at least a part of the particle impurities in the semiconductor pre-cleaning chamber passing through the first through-holes.

Collection assembly and semiconductor pre-cleaning chamber

Provided is a double-gene knockout vector system, a method for preparing porcine fibroblasts with both CD163 gene and CD13 gene being knocked-out, prepared porcine fibroblasts, and a method for preparing a gene-edited pig with both CD163 gene and CD13 gene being knocked-out. The vector system of the present disclosure comprises a CD163 gene knockout vector and a CD13 gene knockout vector. The CD163 gene knockout vector comprises a gene editing vector backbone and a DNA fragment ligated to the gene editing vector backbone, with a nucleotide sequence of the DNA fragment being shown in any one of SEQ ID NOs: 1-3. The CD13 gene knockout vector comprises a gene editing vector backbone and a DNA fragment ligated to the gene editing vector backbone, a nucleotide sequence of the DNA fragment being shown in any one of SEQ ID NOs: 4-6.

Method for preparing porcine fibroblasts with both CD163 gene and CD13 gene being knocked-out

A precleaning chamber () and a plasma processing apparatus, comprising a cavity () and a dielectric window (') disposed at the top of the cavity (), a base () and a process assembly () surrounding the base () are disposed in the precleaning chamber (), and the base (), the process assembly () and the dielectric window (&#x2032;) together form a process sub-cavity () above the base (); and a space of the cavity () located below the base () is used as a loading/unloading sub-cavity (), the precleaning chamber () further comprises a gas is device (), the gas inlet device () comprises a gas inlet (), and the gas inlet () is configured to directly transport a process gas into the process sub-cavity () from above the process assembly (). The precleaning chamber () not only shortens the gas inlet path of the process gas, but also reach a desired plasma density under the conditions where a relatively small amount of process gas is introduced, thereby reducing the usage cost.

Precleaning chamber and plasma processing apparatus

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Beijing, China

Kui Xu