Brewer Science, Inc.

The Penn State Research Foundation

Kui Xu

Mary Ann Hockey

Daniel Sweat

Eric Calderas

Douglas J Guerrero

Qing Wang

Richard Elsworth Daugherty, Jr

Megan Bennett

The present invention is broadly concerned with novel directed self-assembly compositions, processes utilizing those compositions, and the resulting structures that are formed. The composition comprises a block copolymer of polystyrene and a polymethylmethacrylate block with polylactic acid side chains ('PS-b-P(MMA-LA)'). The block copolymer is capable of crosslinking and micro-phase separating into lines and spaces measuring about 10-nm or smaller with sub-20 nm Lcapability. Additionally, PS-b-P(MMA-LA) can be thermally annealed without a top-coat for simpler processing than the prior art. The polylactic acid side chains also increase the etch rate of the poly(methylmethacrylate) block when exposed to oxygen plasma, as well as lower the T.

High-&#x3c7; block copolymers for directed self-assembly

Novel block copolymers ('BCPs') having non-random distributions of comonomers within at least one of the blocks and methods of using those BCPs in directed self-assembly ('DSA') processes are provided. The non-random (e.g., gradient-creating) distributions can be customized in order to concentrate the desired comonomer properties in predetermined areas of the BCP. These BCPs can achieve perpendicular orientation with simple annealing and offer superior long-range ordering and lower defectivity when compared to prior art BCPs. These BCPs can be incorporated into compositions that simultaneously offer the benefits of high-&#x3c7; and rapid thermal-annealing kinetics while maintaining similar or improved guide process windows when compared to prior art BCPs.

Gradient block copolymers for directed self-assembly

Directed self-assembly (DSA) using block copolymers (BCPs) is emerging as a viable alternative to photolithography for creating features 10 nm and smaller. Block copolymers with balanced surface energy between the polymer blocks, tunable &#x3c7;, and tunable glass transition temperatures (T) have been formulated. The block copolymers can achieve perpendicular orientation by simple thermal annealing due to the surface energy balance between the polymer blocks, which allows avoiding solvent annealing or top-coat. The &#x3c7; value can be tuned up to achieve Las low as 12 nm for lamellar-structured BCPs and hole/pillar size as small as 6 nm for cylinder-structured BCPs. The Tg of the BCPs can also be tuned to lower than those of PS-b-PMMA standards. The enhanced polymer chain mobility resulting from the decreased Tg of the block copolymer may help with improving the kinetics of BCP self-assembly during the thermal annealing.

High-chi block copolymers with tunable glass transition temperatures for directed self-assembly

Compositions for directed self-assembly (DSA) patterning techniques are provided. Methods for directed self-assembly are also provided in which a DSA composition comprising a block copolymer (BCP) is applied to a substrate and then self-assembled to form the desired pattern. The block copolymer includes at least two blocks and is selected to have a high interaction parameter (&#x3c7;). The BCPs are able to form perpendicular lamellae by simple thermal annealing on a neutralized substrate, without a top coat. The BCPs are also capable of micro-phase separating into lines and spaces measuring at 10 nm or smaller, with sub-20-nm Lcapability.

High-Chi block copolymers for directed self-assembly

We report a new class of single-ion electrolyte including pendant lithium perfluoroethyl sulfonates. Embodiments may be based on, for example, aromatic poly(arylene ether)s, polyphenylenes, or polyarylene sulfides. The microporous polymer film saturated with organic carbonates exhibits a nearly unity t, state-of-the-art conductivities (e.g. &#x3e;10S cmat room temperature) over a wide range of temperatures, high electrochemical stability, and outstanding mechanical properties, which enables the membrane to function as both ion conducting medium and separator in the batteries.

Polymer conductor for lithium-ion batteries

Compositions for directed self-assembly (DSA) patterning techniques are provided. Methods for directed self-assembly are also provided in which a DSA composition comprising a block copolymer is applied to a substrate and then self-assembled to form the desired pattern. The block copolymer includes at least two blocks of differing etch rates, so that one block (e.g., polymethylmethacrylate) is selectively removed during etching. Because the slower etching block (e.g., polystyrene) is modified with an additive to further slow the etch rate of that block, more of the slow etching block remains behind to fully transfer the pattern to underlying layers.

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Rolla, MO, United States of America

Kui Xu