Samsung Electronics Co., Ltd.

Techno Semichem Co., Ltd.

Kui-Jong Baek

Hong-Sick Park

Jong-Hyun Choung

Bong-Kyun Kim

Byeong-Jin Lee

Sun-Young Hong

Tai-Hyung Rhee

Yong-Sung Song

Ji-Sun Lee

Dong-Min Kang

Young-Nam Kim

Hyun-joon Kim

Jung-hun Lim

Chun-Deuk Lee

Woong Hahn

An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water.

Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same

In one aspect, a composition is provided which is capable of removing an insulation material which includes at least one of a low-k material and a passivation material. The composition of this aspect includes about 5 to about 40 percent by weight of a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizing agent, about 10 to about 50 percent by weight of a second oxidizing agent, and a remaining water.

Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the same

Growing community of inventors

Daejeon, South Korea

Kui-Jong Baek