Taiwanj Pharmaceuticals Co., Ltd.

United Microelectronics Corp.

Kuang Yuan Lee

Syaulan S Yang

Yan-Feng Jiang

Meng Hsien Liu

Yu-Shiou Fan

Jui-Hsiang Pan

Cheng-Kuang Sun

Meng-Hsien Liu

Sheng Hung Liu

Mei-chi Hsu

Chiung Wen Wang

Chi-Han Chen

Yan-feng Jiang

The present disclosure relates to a compound of Formula I, or a geometric isomer, enantiomer, diastereomer, racemate, atropisomer, pharmaceutically acceptable salt, prodrug or solvate thereof. The present disclosure further relates to a composition comprising the compound of Formula (I). The compound and the composition described herein can be used to inhibit NADPH oxidase activity. 

NADPH oxidase inhibitors, pharmaceutical composition comprising the same, and application thereof

A novel structure of an opioid antagonist is provided. One of the exemplary compounds of the present disclosure has the structure of Formula (II). The present disclosure overcomes the discomfort of conventional opioid antagonist due to rapid absorption and improves the patient compliance thereof. 

Prodrugs of Naltrexone, Nalmefene and derivatives thereof

The present disclosure provides a benzene fused heterocyclic derivative of Formula (I):is a single or double bond; n is an integer of 0 or 1; A is &#x2014;CH&#x2014;, &#x2014;CH(OH)&#x2014;, or &#x2014;C(O)&#x2014;; G is C or N; X is &#x2014;CH&#x2014;, O, or &#x2014;C(O)&#x2014;; Y is alkyl, aryl, or heterocyclic alkyl optionally substituted with at least one substituent independently selected from a group consisting of: H, halogen, alkyl, alkyl substituted with at least one halogen, aryl, aryl substituted with at least one halogen, &#x2014;NRR, &#x2014;OR, &#x2014;RC(O)R, &#x2014;C(O)R, &#x2014;C(O)OR, &#x2014;C(O)ORRy3, &#x2014;NRC(O)R, &#x2014;NRC(O)NRR, &#x2014;NRC(O)ORR, &#x2014;NRC(O)ROR, C(O)NR(RR), &#x2014;C(O)NR(ROR), &#x2014;ORR, and &#x2014;OROR, wherein each of Rand Ris independently selected from a group consisting of H, oxygen, alkyl, and aryl, and Ris aryl optionally substituted with at least one halogen; Z is &#x2014;NRR, &#x2014;NRR, &#x2014;OR, &#x2014;ORR, &#x2014;C(O)RR, &#x2014;C(O)ORR, &#x2014;NRC(O)RR, &#x2014;NRC(O)ORR, &#x2014;C(O)NRR, or OROR, wherein each of Rand Ris independently selected from a group consisting of H, oxygen, alkyl and aryl, and Ris aryl optionally substituted with at least one substituent independently selected from a group consisting of halogen, OH, &#x2014;RCOOR, &#x2014;ORCOOR, &#x2014;RSOR, &#x2014;RSONRRR, &#x2014;RC(O)RR, &#x2014;RC(O)NRRR, &#x2014;RZC(O)NRSOR, wherein Rza is nil or alkyl, Ris H or alkyl, each of Rand Ris independently selected from a group consisting of H, OH, alkyl, aryl, alkoxyl, or NRRis a nitrogen-containing heterocyclic alkyl ring, Ris nil or a sulfonyl alkyl group. 

Benzene fused heterocyclic derivative and pharmaceutical composition comprising the same

A process for fabricating a semiconductor device is provided. The process integrates a cutting film process into the front-end of semiconductor process. The cutting film is directly formed on the curved surface of the micro-lens or a passivation layer is formed on the micro-lens before covering the passivation layer with the cutting film. In addition to micro-particle contamination due to sawing, the process is able to simplify chip packaging and reduce the size of a photosensitive module.

Process for manufacturing semiconductor device

Growing community of inventors

Hsinchu, Taiwan

Kuang Yuan Lee