Taiwan Semiconductor Manufacturing Comp. Ltd.

Au Optronics Corporation

Windbond Electronics Corp.

Kuan-Ting Chen

Wen-Hao Chen

Jyun-Hao Chang

Chun-Yao Ku

Ming-Tao Yu

Chih-Ming Chen

Chun-Chi Lai

Tsang-Hong Wang

Chia-Yuan Yeh

Feng-Sheng Lin

Chia-Hsien Chu

Chee-Wai Lau

Tsai-Chi Yeh

An-Hsiung Hsieh

Pei-Chi Hsu

Tzong-Liang Chen

Hao-Chien Yung

Ting-Wei Chung

Ming-Huei Lin

A method of forming an integrated circuit includes placing a first and a second standard cell layout design of the integrated circuit on a layout design, and manufacturing the integrated circuit based on at least the first or second standard cell layout design. The first standard cell layout design has a first height. The second standard cell layout design has a second height. Placing the first standard cell layout design includes placing a first set of pin layout patterns on a first layout level over a first set of gridlines, extending in a first direction, and having a first width in a second direction. Placing the second standard cell layout design includes placing a second set of pin layout patterns on the first layout level over a second set of gridlines, extending in the first direction, and having a second width in the second direction.

Integrated circuit and method of forming the same

A method of forming an integrated circuit includes generating a first and second standard cell layout design, and manufacturing the integrated circuit based on at least the first or second standard cell layout design. The first standard cell layout design has a first height. The second standard cell layout design has a second height different from the first height. The second standard cell layout design is adjacent to the first standard cell layout design. Generating the first standard cell layout design includes generating a first set of pin layout patterns extending in a first direction, being on a first layout level, and having a first width. Generating the second standard cell layout design includes generating a second set of pin layout patterns extending in the first direction, being on the first layout level, and having a second width different from the first width.

A touch display apparatus including a first substrate, a first sub-pixel, a spacer, a second substrate, and a touch-sensing electrode is provided. The first sub-pixel is disposed on the first substrate. The spacer is disposed on the first substrate. The touch-sensing electrode is disposed on the second substrate and has a first opening. The spacer is located inside the first opening in an orthogonal projection direction. A distance D is defined between an outline of an orthogonal projection of the spacer on the first substrate and an outline of an orthogonal projection of the first opening on the first substrate, and D&#x2265;5 &#x3bc;m.

Touch display apparatus

A circuit substrate includes a substrate, a first lead line, a second lead line, an insulating layer and a pad. The substrate has a pad region, a first non-pad region and a second non-pad region. The first lead line extends from the first non-pad region to the pad region. The second lead line extends from the second non-pad region to the pad region. The insulating layer is interposed between the first and second lead lines. The pads are on the pad region of the substrate and one of the pads is electrically connected to the first and second lead lines. A display panel including the circuit substrate is also provided.

Circuit substrate and display panel including the same

A method for manufacturing an inductor with resonant frequency and Q value increased in semiconductor process can reduce substrate coupling effect, because (an) air layer(s) is/are formed just under a spiral metal layer which functions as an inductor. In addition, part of the substrate material still remains around the air layer(s), which can be used as a support for the spiral metal layer. Therefore, a problem causing the above-mentioned spiral metal layer to collapse will never occur.

Method for manufacturing an inductor with resonant frequency and Q value

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Hsinchu, Taiwan

Kuan-Ting Chen