Taiwan Semiconductor Manufacturing Comp. Ltd.

Kuan-Chi Chen

Ying Ying Wang

Po-Chang Huang

Shellin Liu

Chi-Ming Tsai

Dong-Hsu Cheng

Peng-Ren Chen

Jia-Guei Jou

Chih-Chung Huang

Yen-Tung Hu

Shiuan-Li Lin

Ya-Hsuan Wu

The present disclosure provides a method and a system for generating photomask patterns. The system obtains a design layout image, and generates a hotspot image corresponding to the design layout image based on a hotspot detection model. The system generates two photomask patterns based on the hotspot image. The at least two photomask patterns are transferred onto a semiconductor substrate.

Method and system for generating photomask patterns

Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.

Semiconductor overlay production system and method

A method of making a mask includes receiving an IC design layout from a designer, applying an logic operation (LOP) correction, performing an OPC correction, fracturing the modified data into a plurality of main features in an electron beam format, and sending the electron beam format data to a mask writer for a mask fabrication. An XOR operation is implemented into the method to check and verify if a pattern is lost during OPC modification and/or data fracture. A BACKBONE XOR operation is also implemented into the method for a plurality of main features with a critical dimension (CD) size smaller than the max OPC correction to check and verify if a small pattern feature is lost during OPC modification and/or data fracture for 45 nm and beyond semiconductor technologies.

Mask making with error recognition

Growing community of inventors

Hsinchu, Taiwan

Kuan-Chi Chen