International Business Machines Corporation

Krishna S Bajjuri

Alshakim Nelson

Jitendra Singh Rathore

Qiu Dai

Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.

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San Jose, CA, United States of America

Krishna S Bajjuri