Applied Materials, Inc.

Krishna Kumar Kuttannair

Kartik Ramaswamy

Yang Yang

Aaron Muir Hunter

Stephen Moffatt

Jie Yu

Yue Guo

Chongyang Wang

Leonid Mark Tertitski

Shay Assaf

Adrian Rhee

Venkatesh Babu

Robert D Flores

Brendan Hickey

Song J Park

Methods and apparatus using a matching network for processing a substrate are provided herein. For example, a matching network configured for use with a plasma processing chamber comprises a local controller connectable to a system controller of the plasma processing chamber, a first motorized capacitor connected to the local controller, a second motorized capacitor connected to the first motorized capacitor, a first sensor at an input of the matching network and a second sensor at an output of the matching network for obtaining in-line RF voltage, current, phase, harmonics, and impedance data, respectively, and an Ethernet for Control Automation Technology (EtherCAT) communication interface connecting the local controller to the first motorized capacitor, the second motorized capacitor, the first sensor, and the second sensor.

RF impedance matching networks for substrate processing platform

A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam to a target location on a surface, while keeping the optical path length substantially constant for all target locations on the surface. The surface is rotated by a rotational actuator to bring all target locations to positions accessible by the beam targeting optics. Imprecision in targeting and optical path length may be compensated by providing an actuated aperture at the beam entry point and/or a variable focus lens with an optical range finding detector, all in communication with the controller.

Laser beam positioning system

A method and system for managing process jobs in a semiconductor fabrication facility is described. In one embodiment, the method includes receiving a plurality of process jobs associated with one or more priorities. The method further includes executing the plurality of process jobs in an order reflecting the priorities. The order is modifiable in real time upon receiving a new process job with a priority higher than the priorities of the plurality of process jobs.

Method and system for managing process jobs in a semiconductor fabrication facility

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San Jose, CA, United States of America

Krishna Kumar Kuttannair