Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Asml Holding N.v.

Krijn Frederik Bustraan

Sjoerd Nicolaas Lambertus Donders

Simon Gijsbert Josephus Mathijssen

Antonius Franciscus Johannes De Groot

Sander Bas Roobol

Nan Lin

Petrus Wilhelmus Smorenburg

Gerrit Jacobus Hendrik Brussaard

Sudhir Srivastava

Erik Roelof Loopstra

Jerome Matula, Jr

Harmen Klaas Van Der Schoot

Yang-Shan Huang

Sander Theodoor Pastoor

Marcel Koenraad Marie Baggen

Theo Anjes Maria Ruijl

Adrianus Johannes Josephus Van Der Horst

Arjan Franklin Bakker

Olav Johannes Seijger

Fransicus Mathijs Jacobs

Paul Peter Anna Antonius Brom

Funda Sahin Nomaler

Arjan Gijsbertsen

Jasper Anne Frido Marikus Simons

Arjan Martin Van Der Wel

Justus Bjorn Post

Paul Van Dongen

Ibrahim Acan

Tom Jan Severijn

Minkyu Kim

Sahin Funda

Ronald Josephus Maria Lamers

Erwin Andreas Bernardus Mulder

Rinze Koolstra

Justus B Post

A substrate holder to hold a substrate in a substrate holding position, the substrate holder including: a frame, multiple surface clamping devices arranged on the frame to clamp a substrate at an upper surface thereof, wherein the surface clamping devices each have a clamping pad to be arranged on the upper surface of the substrate, the surface clamping pads being movable with respect to each other at least in a first direction substantially perpendicular to the upper surface of a substrate held by the surface clamping pads, and one or more actuators to move the surface clamping pads with respect to each other in the first direction.

Substrate holder, carrier system comprising a substrate holder and lithographic apparatus

The invention relates to elastic guiding device to support a mass with respect to a base in a support direction, wherein the stiffness in support direction compared to stiffness in other direction, for example the stiffness in vertical direction compared to the stiffness in horizontal directions is substantially increased. The invention further relates to a positioning device comprising at least one elastic guiding device, and a lithographic apparatus comprising such positioning device.

Elastic guiding device, positioning device, blade and lithographic apparatus

A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.

Positioning system and lithographic apparatus

Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.

Apparatus for delivering gas and illumination source for generating high harmonic radiation

Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

A patient interface assembly includes a support member having a central support portion and a pair of cheek mount supports coupled to the central portion. Each cheek mount support applies a force on or on a side of a user's cheekbone. A seal member is coupled to the support portion and seals against the user. An additional nasal support member is provided that includes a first lateral side member operatively coupled to the central support portion and arranged to be disposed along a first side of a user's nose, and a second lateral side member also operatively coupled the central support portion and arranged to be disposed along a second side of a user's nose. At least a portion of the first lateral side member and the second lateral side member is rigid or semi rigid.

Patient interface assembly with improved stabilization

A magnetic bearing () with an axis of rotation (), wherein the magnetic bearing comprises: a cylindrical rotor () comprising a ferromagnetic material () wherein the cylindrical rotor has an axis of symmetry (), wherein the cylindrical rotor has an inner radius (), wherein the cylindrical rotor has a top side (), a static hub (), wherein the static hub has an overhang () which protrudes from the static hub and is located adjacent to the top side, a lift magnetic actuator apparatus () for controlling the distance () between the top side and the overhang, a radial magnetic actuator apparatus () for controlling the distance () between the inner radius and the axis of rotation.

Magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus

A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

Lithographic apparatus and stage apparatus

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Eindhoven, Netherlands

Krijn Frederik Bustraan