Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Innoluce B.v.

Krassimir Todorov Krastev

Sander Frederik Wuister

Johan Frederik Dijksman

Yvonne Wendela Kruijt-Stegeman

Aleksey Yurievich Kolesnychenko

Klaus Simon

Karel Diederick Van Der Mast

Raymond Jacobus Knaapen

Steven J Plummer

Johannes Balthasar Maria Soetens

Jinling Liu

Hendrikus W L A M Van Lierop

Dawn Barile

Ivar Schram

Antonius Johannes Maria Nellissen

Renatus Hendricus Maria Sanders

Raymond Jacobus Wilhelmus Knaapen

Bruce Eliot Lutheran

Herman M J Soemers

Hermanus M J R Soemers

Renatus H M Sanders

Steven John Plummer

Herman MJ Soemers

Hendrikus WLAM Van Lierop

An imaging apparatus includes a first imaging modality (), a second imaging modality (), wherein the first and second imaging modalities are in alignment with scanning zones for scanning an object or subject, and a third imaging modality () which is selectively moveable between a first location () in which the third imaging modality is in alignment with the scanning zones for scanning the object or subject and a second location () in which the third imaging modality is outside of alignment with the scanning zones.

Multiple imaging modality imaging apparatus

A multi-modal imaging system () includes a fixed gantry (), and a swivel gantry (). The fixed gantry () supports a first imaging modality. The swivel gantry () connects to the fixed gantry () by at least three mounting points () and supports a second imaging modality. Selectively the swivel gantry () includes a swivel frame () and at least three mounting points () for mounting the fixed and swivel gantries together in an imaging configuration. The at least three mounting points () include at least one hinge () which permits the swivel gantry to swivel about the fixed gantry into a service configuration.

Swivel gantry for multi-modal imaging systems

An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Imprint lithography

A MEMS scanning micromirror including a mirror body, the mirror bodyhaving a rotation axiswith a pair of extension barsparallel to the rotation axis; a frameforming a mirror recesswith a recess periphery, the framehaving a pair of opposed frame barson the recess peripheryalong the rotation axis; a pair of cantilever beam assemblies, each of the pair of cantilever beam assembliesbeing fixed to one of the pair of opposed frame barsand coupled to one end of the pair of extension bars; and a pair of vertical support beamsconnected between each of the pair of opposed frame barsto the mirror bodyalong the rotation axis

MEMS scanning micromirror

A MEMS scanning micromirror with reduced dynamic deformation with a mirror support including a rotation axis beamhaving a rotation axis; a pair of extension barsparallel to the rotation axis, each having a first end, a midpoint, and a second end; and a pair of X beams, each of the pair of X beamshaving a cross midpoint. One of the pair of X beamsis connected to the first endand the midpointof each of the pair of extension bars; the other of the pair of X beamsis connected to the midpointand the second endof each of the pair of extension bars; and the rotation axis beamis connected to the cross midpointof each of the pair of X beams

MEMS scanning micromirror with reduced dynamic deformation

A guide for guiding cables and/or hoses between two parts that are moveable relative to each other, the guide including a band having a length, width and thickness, and having a torsional stiffness about a longitudinal axis of the band, a bending stiffness about an axis in the width direction, and a shear stiffness in the thickness direction, multiple blocks fitted to the band, and a deformable member provided between two adjacent blocks, the deformable member being connected to the adjacent blocks and having a torsional stiffness about the longitudinal axis of the band, a shear stiffness in the thickness direction, and a bending stiffness about the axis in the width direction, wherein the torsional stiffness of the deformable member is substantially greater than the torsional stiffness of the band, and wherein the shear stiffness of the deformable member is substantially greater than the shear stiffness of the band.

Guiding device and guiding assembly for guiding cables and/or hoses, and a lithographic apparatus

A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.

Alignment for imprint lithography

Growing community of inventors

Eindhoven, Netherlands

Krassimir Todorov Krastev