Hon Hai Precision Industry Co., Ltd.

Kozo Yano

Katsuhiko Kishimoto

Koshi Nishida

Susumu Sakio

Hideo Takei

A vapor deposition method and a vapor deposition apparatus that, when a vapor deposition material is deposited on a substrate, make it possible to form deposition layer pattern precisely so that the deposition layer pattern is formed uniformly without a gap formed between a deposition mask and the substrate. A deposition mask is disposed with its periphery held by a frame. A substrate on which a vapor deposition layer is to be formed is mounted over the deposition mask. A vapor deposition source is disposed facing the deposition mask and evaporates a vapor deposition material. The vapor deposition is performed while the substrate is pressed vertically at a position of a center of deflection of the deposition mask and on an upper surface of the substrate until that a length of the substrate substantially becomes identical to a length of the deposition mask being bowed down and expanded.

Vapor deposition apparatus, vapor deposition method, and method for manufacturing organic EL display apparatus

A vapor deposition method and a vapor deposition apparatus that, when a vapor deposition material is deposited on a substrate, make it possible to form deposition layer pattern precisely so that the deposition layer pattern is formed uniformly without a gap formed between a deposition mask and the substrate. A deposition mask is disposed with its periphery held by a frame. A substrate on which a vapor deposition layer is to be formed is mounted over an upper surface of the deposition mask. A vapor deposition source is disposed facing the deposition mask and evaporates a vapor deposition material. The vapor deposition is performed while the substrate is pressed vertically at a position of a center of deflection of the deposition mask and on an upper surface of the substrate until that a length of the substrate substantially becomes identical to a length of the deposition mask being bowed down and expanded.

A vapor deposition mask () includes a resin layer () including a plurality of openings (); a magnetic metal layer () located so as to overlap the resin layer, the magnetic metal layer including a mask portion () having such a shape as to expose the plurality of openings and a peripheral portion () located so as to enclose the mask portion; and a frame () secured to the peripheral portion of the magnetic metal layer. The resin layer is not joined to the mask portion of the magnetic metal layer but is joined to at least a part of the peripheral portion of the magnetic metal layer.

Vapor deposition mask, vapor deposition mask production method, and organic semiconductor element production method

A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal layer formed on the resin layer, the method including the steps of: providing a substrate; forming a resin layer by applying a solution including a resin material or a precursor solution of a resin material on a surface of the substrate, and then performing a heat treatment thereon; forming a magnetic metal layer on the resin layer, mask portion including a solid portion where a metal film is present and a hollow portion where the metal film is absent; forming a plurality of openings in a region of the resin layer that is located in the hollow portion of the mask portion; and removing the resin layer from the substrate after forming a plurality of openings in a region of the resin layer.

Vapor deposition mask manufacturing method, vapor deposition mask, and organic semiconductor element manufacturing method

A vapor deposition mask () includes a resin layer () having a first primary surface () and a second primary surface (), and having a plurality of openings (), and a metal layer () having a third primary surface () and a fourth primary surface (), and provided on the first primary surface of the resin layer so that the fourth primary surface is located on the resin layer side, wherein the metal layer is shaped so that the plurality of openings are exposed therethrough. A portion of the first primary surface of the resin layer that is in contact with the metal layer, a portion of the first primary surface of the resin layer that is not in contact with the metal layer, and the third primary surface of the metal layer each include a rough surface region having a depressed/protruding shape.

Vapor deposition mask, vapor deposition mask manufacturing method , and organic semiconductor element manufacturing method

A method for producing a resin film by using a resin material and accurately forming a fine pattern as a vapor deposition mask or an optical element, a method for producing an organic EL display device, a base film for forming a fine pattern and a resin film with a supporting member are provided. A liquid resin material is applied onto a supporting member to form a resin coating film (S), and a temperature of the resin coating film is increased to a temperature at which the resin material cures, to form a baked resin film (S). Thereafter, a base film formed by the baked resin film attached to the supporting member is processed by irradiating with lasers, to form a resin film () having a desired fine pattern and the supporting member (S). Thereafter, the baked resin film on which the fine pattern is formed is peeled from the supporting member, and the resin film having the fine pattern is obtained (S).

Method for producing resin film having fine pattern, method for producing organic el display device, base film for forming fine pattern, and resin film provided with supporting member

A vapor deposition mask used for forming a thin film pattern on a substrate enables to form much higher-definition thin film pattern and to closely attract and hold the vapor deposition mask to and on a surface of a transparent substrate by a magnetic force in a state that the substrate held on a substrate holder is intermediated therebetween, while preventing occurrence of shadow portions (vapor deposition shadows) to which no deposition material is adhered due to a holding member. A vapor deposition maskis composed of a single resin film layeror a resin film layerand a holding memberof a substantially rectangular thin plate frame body, and a metal powderis contained in the resin film layerin which a plurality of through openingsare formed. When having the holding member, a single rectangular openingincluding a portion of the resin film layerwhere a plurality of the through openingsare formed is formed on the holding member

Vapor deposition mask, method of manufacturing the same and method of manufacturing organic light emitting diode using the vapor deposition mask

A deposition mask and a manufacturing method thereof capable of performing vapor deposition at a desired place, without causing any gap between the deposition mask and a substrate for vapor deposition having a surface of irregularity, even when depositing a vapor deposition material only at a predetermined place on a bottom part of the substrate for vapor deposition, are provided. The manufacturing method includes preparing a dummy substrate having irregularity corresponding to a surface shape of the substrate for vapor deposition (step S), coating a liquid resin material on an uneven surface of the dummy substrate to form a resin coating layer (step S), and raising the temperature of the resin coating layer and baking the resin coating layer to obtain a baked resin film (step S). The manufacturing method further includes forming a desired opening pattern on the baked resin film attached to the dummy substrate to obtain a resin film having the desired opening pattern (step S), and subsequently peeling off the resin film from the dummy substrate to obtain a deposition mask (step S).

Growing community of inventors

Osaka, Japan

Kozo Yano