Canon Kabushiki Kaisha

Kozo Hokayama

Takehiko Kawasaki

Hidetoshi Nojiri

Takatsugu Wada

Masatake Akaike

Rei Kurashima

Satoshi Nozu

A device is formed by transferring a film onto a substrate when the film requires but the substrate is not adapted to a high temperature heat treatment process. The film having layers and formed on a first substrate having layers is transferred onto a second substrate having layers. The method of transferring the film comprises a first step of forming a lift-off layer and the film to be transferred on the first substrate, a second step of bonding the film to be transferred to the second substrate and a third step of separating the film to be transferred from the first substrate by etching the lift-off layer and transferring it onto the second substrate.

Growing community of inventors

Kanagawa, Japan

Kozo Hokayama