Cambridge Filter Corporation

Kondoh Industries, Ltd.

Cambridge Filter Japan, Ltd.

Kouta Ueno

Toshiro Kisakibaru

Makoto Okada

Isao Honbori

Toshirou Kisakibaru

Makoto Yoshida

Shigeru Kouchiyama

Nobuyuki Uesugi

Naoji Iida

Provided is a soft X-ray static electricity removal apparatus that has achieved an increase in the amount of ionized air discharged, with a simple structure. A soft X-ray static electricity removal apparatus () includes a soft X-ray generation device (), a container (), a soft X-ray shielding sheet (), and an insulating layer (). The soft X-ray generation device generates soft X-rays (). The container () has an outlet () from which ionized air () that has been ionized with the soft X-rays flows out. The soft X-ray shielding sheet () is used at the outlet of the container and includes a first outer sheet (), an interlayer sheet (), and a second outer sheet () which are formed of a material opaque to the soft X-rays. The first outer sheet has supply ports () for the ionized air formed therein; the interlayer sheet has an ionized air passage () formed therein, which includes ionized air inlet openings () that communicate with the supply ports; and the second outer sheet has a discharge port () formed therein, which communicates with the ionized air passage. The supply ports, the ionized air passage, and the discharge port communicate with each other to provide an ionized air transmission portion (). The insulating layer insulates the soft X-ray shielding sheet and the container from each other.

Soft X-ray static electricity removal apparatus

In a semiconductor-fabrication equipment of a minienvironment system, ambient air is prevented from entering a gap between an opening of the semiconductor-fabrication equipment and a wafer gateway of a hermetic container to prevent dust entrained in the ambient air from adhering to wafers in the hermetic container. Clean air is injected from a clean-air injection device (), which is connected to an air-supply device () through an air-supply tube (), and which is provided with filter means () in the from of rectangular frame formed with cylindrically-shaped filters connected to each other, to form an air curtain at the gap () between the gateway () of the hermetic container () through which wafers () are taken out of or put in the hermetic container () and the opening () of a loading part () attached to a front panel () of the semiconductor-fabrication equipment (), thereby shutting off the ambient air that would otherwise enter the hermetic container () through the gap () between the gateway () of the hermetic container () and the opening () of the loading part () attached to the semiconductor-fabrication equipment () when a lid () of the hermetic container () is opened into the semiconductor-fabrication equipment ().

Air-curtain forming apparatus for wafer hermetic container in semiconductor-fabrication equipment of minienvironment system

Growing community of inventors

Tokyo, Japan

Kouta Ueno