Jcu Corporation

Kouta Ibe

Kenichi Nishikawa

Daisuke Sadohara

Katsumi Shimoda

Keita Suzuki

A new method capable of forming a circuit by performing metal plating on a desired portion on a substrate through a small number of steps regardless of the kind of the substrate. A method for forming a circuit on a substrate characterized in that when forming a circuit by plating on a substrate, the method includes steps of applying a coating film containing a silicone oligomer and a catalyst metal onto the substrate, and thereafter, performing an activation treatment of the catalyst metal in the coating film to make the catalyst metal exhibit autocatalytic properties, and then, performing electroless plating.

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Kanagawa, Japan

Kouta Ibe