Ngk Insulators, Inc.

Kouta Asai

Kenshin Kitoh

Naomi Saito

Naoko Takahashi

The present invention provides a layered double hydroxide with improved conductivity, a layered double hydroxide and a composite material containing the layered double hydroxide. The layered double hydroxide is represented by the general formula: [MgM1][AlM2](OH)A.mHO, wherein 0.1&#x2264;x&#x2264;0.4, 0&#x2264;y&#x2264;0.95, and 0&#x2264;z&#x2264;0.95, provided that both y and z are not 0 at the same time; &#x3b1;=1 or 2; &#x3b2;=2 or 3; Ais an n-valent anion, provided that n is an integer of 1 or greater; m&#x2265;0; M1is a cation of at least one substituent element selected from monovalent elements, transition metal elements, and other elements with an ionic radius greater than that of Mg; and M2is a cation of at least one element selected from divalent elements, transition metals, and other elements with an ionic radius greater than that of Al.

Layered double hydroxide, layered double hydroxide dense film, and composite material

Provided is a hydroxide-ion-conductive dense membrane having a He permeability per unit area of 10 cm/min&#xb7;atm or less. The present invention provides a highly-densified hydroxide-ion-conductive membrane that can significantly reduce permeation of substances other than hydroxide ions (in particular, Zn, which may cause growth of dendritic zinc in a zinc secondary battery) and that is particularly suitable for use in, for example, a separator for a battery (in particular, a zinc secondary battery, which may cause growth of dendritic zinc).

Hydroxide-ion-conductive dense membrane and composite material

There is provided a silica membraneformed on a porous substrate. A desorbed ionic strength of water having a temperature of 500&#xb0; C. in a temperature-programmed desorption analysis of water of the silica membrane is 2,000,000/g. The silica membraneis manufactured by allowing a silica sol having a water concentration of 0.03 to 3 mass % to adhere to a porous substrate by an ethanol solvent, drying the silica sol by sending air having a dew point of &#x2212;70 to 0&#xb0; C., and firing the dried silica sol at 200 to 400&#xb0; C.

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Nagoya, Japan

Kouta Asai