Tokyo Electron Limited

Tokyo Electronics Limited

Kouji Takuma

Masahiro Yoshida

Go Ayabe

Keigo Satake

Chikara Nobukuni

Tomiyasu Maezono

Jong Won Yun

Sadamichi Mori

Ryo Manabe

Shinji Sugahara

A substrate processing apparatusincludes processing unitseach configured to process a wafer W; tanksandeach configured to store a processing liquid; processing liquid supply unitsandeach configured to supply the processing liquid into the processing unit; drain unitsandeach configured to drain the processing liquid; supplement unitsandeach configured to supplement the tanksandwith the processing liquids; and a control unit. The control unitis configured to perform a process job by controlling the processing liquid supply unitsandand the processing unitand perform, when predetermined liquid exchange conditions are met during the performing of the process job, a liquid exchange processing in parallel with the process job by controlling the drain unitsandand the supplement unitsand

Substrate processing apparatus, substrate processing method and recording medium of performing liquid exchange processing according to liquid exchange condition

A substrate processing apparatus according to an embodiment includes a carrier mounting part, a substrate mounting part, a first transfer device, a plurality of processing parts, a second transfer device and a controller. The carrier mounting part mounts a carrier that accommodates a plurality of substrates. The first transfer device transfers the substrates between the carrier and a substrate mounting part. The controller causes the first transfer device to execute a take-out operation for taking out the substrate from the carrier to mount the substrate on the substrate mounting part at time intervals equal to or longer than a time required for the first transfer device to take out the substrate from the carrier to mount the substrate on the substrate mounting part and to take out the substrate from the substrate mounting part to accommodate the substrate in the carrier.

Substrate processing device and substrate conveying method

A plasma processing apparatus includes a storage; processors; a liquid supply which supplies, into the storage, at least a first liquid composed of a processing liquid or source liquids for composing the processing liquid; a detector which detects a value of a parameter indicating a state of the first liquid supplied into the storage or a state of the processing liquid in the storage; and a controller which controls the processors to perform a liquid processing in sequence. The controller determines, based on a detection result of the value of the parameter, whether it is possible to supply the processing liquid continuously into a preset number of processors concurrently under a condition requested by the processors, and, if not, the controller performs a simultaneous processing restricting control of reducing a number of processors which are supposed to perform the liquid processing concurrently to be lower than the preset number.

Substrate processing apparatus and operation method of substrate processing apparatus

A substrate processing apparatus includes a substrate processing device, a substrate accommodation-status detection device, a substrate-transport device including a first substrate-transport sub-device which unloads substrates from a carrier and a second substrate-transport sub-device which unloads the substrates from the carrier, a control device including processing circuitry which controls the first and second substrate-transport sub-devices based on detection result of the substrate accommodation-status detection device. The processing circuitry of the control device determines a selection, based on the result of the substrate accommodation-status detection device, between a process in which the processing circuitry of the control device simultaneously drives the first and second substrate-transport sub-devices such that the first and second substrate-transport sub-devices simultaneously unload the substrates from the carrier and a process in which the processing circuitry of the control device drives only the second substrate-transport sub-device such that only the second substrate-transport sub-device unloads the substrates from the carrier.

Substrate processing apparatus, substrate transport method, and computer-readable recording medium with stored substrate transport program

Disclosed is a processing apparatus to restrain load of a common usage system shared by a plurality of liquid processing modules. A processing module group includes k sets of share groups comprising a plurality of processing modules to perform an identical processing for each substrate (where, k&#x2267;2), each set of share groups includes n processing modules (where, n&#x2267;2), and each processing module includes the common usage system shared by n processing modules in each set and having a maximum capacity capable of processing m processing modules (where m&#x2266;n). A carrying mechanism repeatedly loads a substrate one by one to the processing module of each set in sequence. At this time, (1) after the completion of the processing in one processing module that uses the common usage system, the substrate is loaded into another processing module in the same set, or (2) without waiting for the completion of the processing in one processing module, the substrate is loaded into another processing module and then the processing is started in another processing module after the completion of the processing in one processing module.

Processing apparatus and operating method therefor

Disclosed are a substrate processing apparatus, a substrate processing method, and a storage medium, which can process a normal substrate according to a normal schedule in parallel with a substrate to be processed in preference to other substrates. Processing block performs the same types of processes for substrates, carried therein from FOUP placing unit, by using process arms. When a priority substrate having a priority over other substrates are carried, control unit carries and processes the priority substrate in priority processing unit that can receive a next substrate among priority processing units to which a plurality of processing units are partially or wholly assigned, in preference to other substrates.

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Koshi, Japan

Kouji Takuma