Tokyo Electron Limited

Kouji Kimoto

Hiroaki Inadomi

Tooru Nakamura

Shinichi Hayashi

Issei Ueda

Suguru Enokida

Osamu Kuroda

Satoshi Biwa

Satoshi Okamura

Shota Umezaki

Akira Murata

Masahiro Yoshida

Yasuo Kiyohara

Tetsuro Nakahara

Nobuya Yamamoto

Katsuhiro Ookawa

Yoshihisa Aoyama

Keiichi Yahata

A substrate processing apparatus includes multiple first substrate processing devices, one or more second substrate processing devices and a transfer unit. Each of the multiple first substrate processing devices is configured to process a substrate one by one. The one or more second substrate processing devices are configured to simultaneously process multiple substrates, which are processed in the multiple first substrate processing devices. The transfer unit is configured to simultaneously carry the multiple substrates, which are processed in the multiple first substrate processing devices, into a same second substrate processing device.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus according to an embodiment includes a transport block and a plurality of processing blocks. In the transport block, a transport device for transporting a substrate is disposed. The plurality of processing blocks are disposed adjacent to the transport block and process the substrate transported by the transport device. Each processing block includes one liquid processing unit and one drying unit. The liquid processing unit performs a liquid film forming processing so as to form a liquid film on the top surface of the substrate. The drying unit performs a supercritical drying processing in which the substrate is dried by bringing the substrate into contact with the processing fluid in a supercritical state. The liquid processing unit and the drying unit included in the same processing block are disposed on the same side with respect to the movement direction of the transport device of the transport block.

Substrate processing apparatus having processing block including liquid processing unit, drying unit, and supply unit adjacent to the transport block

Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.

Substrate processing apparatus

A substrate processing apparatus includes a substrate transit table configured to mount thereon a plurality of substrates; a substrate processing chamber configured to process the substrate one by one; a substrate transfer device capable of loading the substrate into the substrate processing chamber from the substrate transit table and unloading the substrate from the substrate processing chamber to the substrate transit table; and N number of (N is an integer equal to or larger than 3) substrate holding devices provided at the substrate transfer device and configured to hold the substrates one by one. Here, a multiplicity of (2 to N&#x2212;1 number of) substrates are concurrently held by 2 to N&#x2212;1 number of substrate holding devices among the N number of substrate holding devices and one substrate is loaded into the substrate processing chamber.

Substrate processing apparatus, substrate processing method and storage medium storing substrate processing program

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Kumamoto, Japan

Kouji Kimoto