Nagano Keiki Seisakusho, Ltd.

Kouichiro Sugisaki

Hiroshi Nagasaka

Daiji Uehara

An electrode structure for a semiconductor device is formed on the semiconductor device, consisting of silicon formed on a substrate to detect a physical quantity of the substrate and converting it into an electric signal, and transfers the converted electric signal to the outside. The electrode structure for the semiconductor device has a barrier layer consisting of a high-melting metal nitride and formed on a contact area of the semiconductor device and an electrode wiring formed on the barrier layer. The barrier layer has different composition ratios of the high-melting metal nitride in correspondence to each stage in the thickness of the barrier layer, in which the composition ratios are a composition ratio making a powerful bond performance at a bonding border area with the electrode wiring, and a composition ratio in which a metal element of the electrode wiring does not diffuse into the semiconductor in the barrier layer.

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Tokyo, Japan

Kouichiro Sugisaki