Hitachi-high-technologies Corporation

Kouichi Yamamoto

Hidetoshi Morokuma

Hiroki Kawada

Katsuhiro Sasada

Atsushi Kobaru

Sho Takami

Norio Satou

Kunio Nakanishi

Shinobu Otsuka

Masaru Izawa

Atsushi Itou

Kenji Nakata

Kaneo Kageyama

In a plasma processing apparatus in which a wafer is processed while supplying radio frequency power to electrodes disposed in a sample stage in a processing chamber within a reactor via a matching box, by matching a specific value of power at transition points of data values of at least two kinds among characteristic data including light emission intensity of the plasma, magnitude of its time variation, a matching position of the matching box, and a change of a value of a voltage of the radio frequency power supplied to the electrodes detected by varying the power to a plurality of values during the processing with a value detected by using characteristic data which is detected during the processing executed on a wafer of the same kind in a different reactor, the differences of the states inside the processing chamber or plasma among a plurality of semiconductor processing apparatuses or reactors are reduced.

Plasma processing apparatus and plasma processing method

An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third scanning line located between a first scanning line and a second scanning line is scanned. After the first, second and third scanning lines have been scanned, a plurality of scanning lines are scanned between the first and third scanning lines and between the second and third scanning lines.

Image forming method and charged particle beam apparatus

A control system and method of a semiconductor inspection system are disclosed, wherein the inspection can be conducted without reducing the reliability of measurement even in the case where the supply voltage drops. The control system has a controller, a power supply for a power on-off circuit constituting a switching regulator designed to maintain the output voltage against a supply voltage drop, and a supply voltage drop detector. In the case where a supply voltage drop is detected during the measurement, the measurement is automatically suspended, and after restoring the supply voltage, the measurement is automatically restarted.

Control system and method of semiconductor inspection system

A method and an apparatus for calculating a scan signal so that the scan region becomes a scan region which is based on magnification ratio between desired magnification in a scan-line interval direction and desired magnification in a scan-line direction, and performing a calculation for rotating the scan direction with respect to the scan signal in order to suppress a distortion which is caused to occur when the technology where the scan direction of a charged particle beam is rotated is applied to the technology where the charged particle beam is scanned such that the scan-line interval is enlarged.

Charged particle beam scanning method and charged particle beam apparatus

An electrostatic chuck comprises a sample stage provided with electrodes and for applying n-phase alternating voltage wherein n is equal to or greater than 2, and a circuit for applying the n-phase alternating voltage. The present electrostatic chuck realizes smooth and speedy attraction/separation of the substrate without the need for a charge elimination process, and the present chuck solves the problem of substrate vibration.

Growing community of inventors

Hitachinaka, Japan

Kouichi Yamamoto