Shin-etsu Chemical Co., Ltd.

Kouichi Yamaguchi

Hirofumi Kishita

Shinichi Sato

Masatoshi Arai

Noriyuki Koike

Kenichi Fukuda

Shuji Suganuma

Nobuyuki Kobayashi

Takashi Matsuda

Toshio Takago

Hiromasa Yamaguchi

Hitoshi Kinami

Hideki Fujii

Kouji Takano

Yoshikazu Saito

Yasushi Yamamoto

Yasuo Tarumi

Satoshi Watanabe

Toshinobu Ishihara

Yoshihiro Kubota

Hironao Fujiki

Katsuya Takemura

Meguru Kashida

Hiroshi Inomata

Yuichi Hamada

Noboru Shimamoto

Hiroto Sugahara

Kazuhiko Tomaru

Kazumasa Maruyama

Kouichi Ishida

An anti-reflection film which includes an inorganic anti-reflection layer including a silicon dioxide-based inorganic layer and having a monolayer structure or plural-layer structure, and a stain-resistant layer provided as a surface layer, is provided. The stain-resistant layer is composed of a cured product of a particular fluorine-containing silazane compound. An optical member having the anti-reflection film on a substrate, such as an optical element, is also provided. These have good stain resistance, wipe off cleanability, mar resistance and water and oil repellency, and these properties have good durability.

Anti-reflection film and optical members using the same

A novel perfluoropolyether-modified aminosilane cures into a film having improved water and oil repellency, parting and anti-staining properties. A surface treating agent comprising the aminosilane, and an article with a coating of the aminosilane are also provided.

Perfluoropolyether-modified aminosilane, surface treating agent, and aminosilane-coated article

A hydrogen absorbing alloy electrode having on a conductive support a layer which contains as a main component a hydrogen absorbing alloy powder capable of absorbing and releasing hydrogen electrochemically and is covered with a fluorine-containing water repellent layer on the surface side; with the fluorine-containing water repellent layer being a layer formed by coating and curing a water repellent agent comprising (A) a straight-chain perfluorinated compound having at least two secondary amino groups per molecule and a divalent perfluoroalkylene or perfluoropolyether structure in the main chain and (B) a fluorine-containing epoxy compound having at least three epoxy groups per molecule.

Hydrogen absorbing alloy electrode and method of producing the same

The invention is directed at novel fluorinated amide compounds of formula (1): ##STR1## wherein Rf is a divalent perfluoroalkylene or perfluoropolyether group, X is a group of formula (2), (3) or (4), and m is an integer inclusive of 0. ##STR2## R.sup.1 is a monovalent hydrocarbon group, and R.sup.2 is a divalent hydrocarbon group. These compounds can be used to obtain elastomers or cured resins having a high fluorine content and a low surface energy, making them effective as starting materials in the production of chemical and solvent-resistant elastomeric materials, parting agents, and water repellents.

Fluorinated amide compounds

A fluorine-containing curable composition comprises (A) a linear perfluoro compound having at least two secondary amino groups per molecule and a divalent perfluoroalkylene or divalent perfluoropolyether structure in the main chain, and (B) a crosslinkable fluorinated compound having at least three functional groups which are crosslinkable with the secondary amino groups of (A). This composition readily cures, with standing at room temperature or heating only, to a cured product having excellent solvent and chemical resistance.

Flourine-containing curable compositions

Disclosed is a novel compound which is a perfluoroalkylene dianilide compound represented by the general formula ##STR1## in which Rf is a perfluoroalkylene group optionally interruptrd by oxygen atoms to form an ether linkage and R and R.sup.1 are each a hydrogen atom or a monovalent hydrocarbon group. When this compound has two or more hydrogen atoms directly bonded to the silicon atoms in a molecule, the compound is useful as a crosslinking agent for an organosilicon compound having two or more silicon-bonded vinyl groups in a molecule. Alternatively, the compound having two or more silicon-bonded vinyl groups in a molecule is useful as a crosslinking agent for an organosilicon compound having two or more silicon-bonded hydrogen atoms in a molecule. The dianilide compound is prepared by the coupling reaction between a perfluoroalkylene dicarboxylic acid difluoride and an N-trimethylsilyl-N-(3,5-disilylphenyl) amine compound.

Fluorine-containing amide compound

The invention is directed at novel fluorinated amide compounds of formula (1): ##STR1## wherein Rf is a divalent perfluoroalkylene or perfluoro-polyether group, X is a group of formula (2), (3) or (4), and m is an integer inclusive of 0. ##STR2## R.sub.1 is a monovalent hydrocarbon group, and R.sup.2 is a divalent hydrocarbon group. These compounds can be used to obtain elastomers or cured resins having a high fluorine content and a low surface energy, making them effective as starting materials in the production of chemical and isolvent-resistant elastomeric materials, parting agents, and water repellents.

A method of forming a resist pattern comprising forming a photoresist layer on a substrate, forming a transparent anti-reflective film on said photoresist layer by applying an anti-reflective material onto said photoresist layer, said anti-reflective material comprising a fluorinated resin which is soluble in an organic hydrocarbon solvent, exposing a light to said resist layer through said transparent anti-reflective film, removing said anti-reflective film using an organic hydrocarbon solvent, and developing said photoresist layer.

Method of forming resist pattern utilizing fluorinated resin

A straight-chain organopolysiloxane represented by the general formula: ##STR1## wherein R.sup.1 represents a monovalent hydrocarbon group, R.sup.2 represents a bivalent organic group, Rf represents a perfluoroalkyl ether group or a perfluoroalkyl group, X represents a hydrogen atom or an organosilyl group, and n is an integer of 15 to 4,000 and having a content of cyclic polysiloxanes with a molecular weight of 3,000 or below of 50 ppm or below. This organopolysiloxane is novel in that the content of cyclic siloxanes with a molecular weight of 3,000 or below is only 50 ppm or below and the organopolysiloxane can obviate contact failure due to volatilization of components or surrounding contamination due to bleeding when used as materials in the field of electricity and electronics or as building materials.

Organopolysiloxane

An extremely reactive and highly copolymerizable hexafluoropropylene oxide oligoether derivative, to give bi- or ter-polymers with fluoroolefins and perfluoroalkyl vinyl ethers, which is represented by general formula: ##STR1## wherein X is a fluorine atom or trifluoromethyl group; and n is an integer of 2-5.

Hexafluoropropylene oxide oligother derivative and process for

An organopolysiloxane composition comprising (A) a linear, alkenyl-containing, fluorinated organopolysiloxane, (B) a cyclic fluorinated organosiloxane as a tackifier, (C) an organohydrogenpolysiloxane having at least two hydrogen atoms attached to a silicon atom in a molecule, and (D) a platinum group metal catalyst has excellent properties inherent to fluorinated silicone rubber, and cures into products having adhesion and close contact to various materials including metals, glass and resins.

Organopolysiloxane compositions

A novel organic silicon compound having at least one .tbd.SiH group in a molecule and a fluorinated organic group at either end is a useful crosslinking agent for various resins, especially fluorinated resins. An organopolysiloxane composition comprising (A) an organopolysiloxane having in a molecule at least two alkenyl groups and at least one fluorinated substituent, (B) an organohydrogenpolysiloxane having at least two .tbd.SiH groups in a molecule and a fluorinated organic group at either end, and (C) a platinum catalyst is readily curable to products having solvent and moisture resistance.

Organic silicon compounds and curable organopolysiloxane compositions

A cyclotrisiloxane represented by the general formula (1): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 may be the same or different and are each an alkyl group of 1 to 3 carbon atoms and X is a cyclohexyl group or an alkyl group expressed by the formula:

Cyclotrisiloxane and process for producing the same

Organic silicone compounds of this invention are expressed by the following general chemical formula: ##STR1## wherein R.sup.1 is a substituted or unsubstituted alkyl group with 1 to 4 carbon atoms, R.sup.2 is substituted or unsubstituted monovalent hydrocarbon group, X is either a hydrogen atom or a triorganosilyl group which is expressed by the following general chemical formula (2): ##STR2## wherein R.sup.3, R.sup.4 and R.sup.5 are a substituted or unsubstituted monovalent hydrocarbon group with 1 to 8 carbon atoms, each of which may be the same or different, p is an integer from 4 to 16, m is an integer from 0 to 1000, and n is an integer from 1 to 1000. The organic silicon compounds of this invention are extremely useful as raw material of rubber cured products with high strength and a superior transparency.

Organic silicon compounds

A chain organopolysiloxane is obtained by polymerizing a fluorine-containing cyclotrisiloxane of the general formula: ##STR1## (wherein R.sup.1 is a monovalent hydrocarbon group, and Rf is a perfluoroalkyl group or perfluoroalkyl ether group) in the presence of a lithium silanolate catalyst, silylating the resulting polymerization product, and treating the silylated product at a temperature of not lower than 100.degree. C. under a reduced pressure of not higher than 10.sup.-1 mmHg to remove volatile components therefrom. The organopolysiloxane is essentially free of volatile low-molecular siloxanes. Therefore, the chain organopolysiloxane can be used without the problems which might arise from the volatile low-molecular siloxanes, such as evaporation of low-molecular siloxanes from a cured rubber product with the result of electrical-contact troubles.

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Takasaki, Japan

Kouichi Yamaguchi