Fujitsu Semiconductor Limited

Shiseido Company, Limited

Fujitsu Microelectronics Limited

Fujitsu Corporation

Other

Jujo Paper Co., Ltd.

Kouichi Nagai

Takashi Matsuda

Hideaki Kikuchi

Kaoru Saigoh

Yuko Nagare

Satoshi Yamaki

Kei Ujimoto

Makoto Takahashi

Marianne Ayaka Touati

Yukimasa Miyazaki

Tetsuo Yaegashi

Ryoya Ito

Hitoshi Saito

Kazuhiro Asai

Naoya Sashida

Jirou Miura

Katsuhiro Sato

Hideyuki Kanemitsu

Kaoru Sugawara

Takashi Matsui

Wensheng Wang

Tadashi Otaka

Yukio Kobayashi

Kazuyuki Miyazawa

Takahiro Ikeda

Yasutaka Ozaki

Yutaka Kojima

Kazutoshi Izumi

Tomoyuki Kikuchi

Tetsuya Kanemaru

Hiroyo Oshima

Takuya Hiruma

Yurika Watanabe

Takahiro Katori

Takahiro Yamagata

Masahito Kudou

Kayoko Naoi

Hajime Tani

Bianca Mccarthy

Renaud Gillet

Tsukasa Sato

Shiho Iwami

Masahito Kudo

There is provided a novel composition containing a UV wavelength conversion substance, a dispersant, a UV absorber and/or a UV scattering agent, and an oil content, wherein the blending amount of the dispersant is 1% by weight or more.

Cosmetic comprising ultraviolet wavelength conversion substance

Provided is an emulsion cosmetic having the innovative, unprecedented property in which the ultraviolet protection effects do not decrease, and conversely increase, due to heat applied in a usage environment. The present invention pertains to an emulsion cosmetic comprising (A) an ultraviolet protectant, (B) a polyhydric alcohol having an IOB value of 5.0 or lower, and (C) an ester oil having an IOB value of 0.3 or higher.

Emulsion cosmetic

Providing a cosmetic having a smooth after-feel even if the cosmetic contains a high proportion of oil. A cosmetic includes (A) a starch powder, and as oils, (B) a polar oil and (C) a volatile oil. The ratio of (C) the volatile oil to (B) the polar oil being 0.5 or higher.

Cosmetic

The present invention relates to a cosmetic in which the ultraviolet protection effects are increased by heat, and a method for manufacture thereof. The manufacturing method of the present invention includes

Cosmetic product

The present invention relates to an oil-based cosmetic having the innovative, unprecedented property in which the ultraviolet protection effects increase due to heat. The oil-based cosmetic of the present invention contains

Oil-based cosmetic

The present invention relates to a cosmetic having the innovative, unprecedented property in which the ultraviolet protection effects do not decrease, but conversely increase, due to coming into contact with moisture such as water or perspiration, and due to heat applied in the usage environment. The cosmetic of the present invention contains (A) an ultraviolet protectant; (B) at least one compound that is water-soluble and that has an IOB of 5.0 or lower, selected from among (i) alkylene oxide derivatives and (ii) polyhydric alcohols; and (C) an oil phase thickener; wherein 

Cosmetic preparation

The purpose of the present invention is to newly provide a method with which it is possible to appropriately evaluate the protective effect of an external preparation for skin such as a sunscreen cosmetic, particularly to evaluate how a UV-ray protective effect is affected by heat. This evaluation method is characterized by including (1) a step for forming a coating film of an external preparation for skin on a substrate, (2) a step for heat-treating the coating film of the external preparation for skin, and (3) a step for measuring the UV-ray protective effect of the heat-treated coating film of the external preparation for skin. The heat treatment is preferably carried out for at least one minute at a temperature of 30-70&#xb0; C. The step for measuring the UV-ray protective effect preferably includes at least one selected from testing methods that involve comparing some kind of UV-ray protective effect with SPF measurement, UVAPF or PFA measurement, critical wavelength measurement, absorbance measurement, and transmittance measurement. This evaluation method can also be performed in vivo or in vitro.

Method for evaluating protective effect against external damage to skin

The invention provides a cosmetic having strong resistance to contact with water, clothing, fingers, and abrasion with little decline (post-contact) in the cosmetic effects such as UV blocking protection as well as excellent feel on use. The cosmetic contains: (A) plate-shaped powder, (B) 6-40% by mass UV absorber, and (C) cationic surfactant.

Durable sunscreen cosmetic

A transparent composition having UV protection effect is provided, wherein the UV protection effect is improved after the composition is contacted with moisture, such as water or sweat, more than that immediately after the composition is applied, while maintaining high transparency. The transparent composition contains (a) a UV absorbent, (b) an oil component having a refractive index in the range from 1.5 to 1.7, (c) an oil component having a refractive index of not less than 1.3 and less than 1.5, and (d) a powder having a refractive index in the range from 1.45 to 1.55, wherein a mixed oil component obtained by mixing the (b) oil component having a refractive index in the range from 1.5 to 1.7 and the (C) oil component having a refractive index of not less than 1.3 and less than 1.5 has a refractive index in the range from 1.44 to 1.56.

Transparent composition and transparent cosmetic

After the formation of a first interlayer insulating, an etching stopper film made of SiON is formed thereon. Subsequently, a contact hole extending from the upper surface of the etching stopper film and reaching a high concentration impurity region is formed, and a first plug is formed by filling W into the contact hole. Next, a ferroelectric capacitor, a second interlayer insulating film, and the like are formed. Thereafter, a contact hole extending from the upper surface of the interlayer insulating film and reaching the first plug is formed. Then, the contact hole is filled with W to form a second plug. With this, even when misalignment occurs, the interlayer insulating film is prevented from being etched.

Semiconductor device

A method for manufacturing a semiconductor device including a semiconductor substrate having transistors formed thereon, a first interlayer insulating film formed above the semiconductor substrate and the transistors, a ferroelectric capacitor formed above the first interlayer insulating film, a second interlayer insulating film formed above the first interlayer insulating film and the ferroelectric capacitor, a first metal wiring formed on the second interlayer insulating film, and a protection film formed on an upper surface of the wiring but not on a side surface of the wiring.

Semiconductor device and method of manufacturing the same

The present invention provides a semiconductor wafer characterized by including: a silicon substrate which includes chip regions and scribe regions; multiple-layered films formed on the silicon substrate; and a reference mark formed in at least one film constituting the multiple-layered films. In addition, the semiconductor wafer is also characterized in that the reference mark is located at least one of the vertices of a virtual rectangle covering the plurality of chip regions, and in that the reference mark is longer than one side of each of the chip regions.

Semiconductor wafer and method of testing the same

A semiconductor device is provided having a pad with an improved moisture blocking ability. The semiconductor device has: a circuit portion including a plurality of semiconductor elements formed on a semiconductor substrate; lamination of insulator covering the circuit portion, including a passivation film as an uppermost layer having openings; ferro-electric capacitors formed in the lamination of insulator; wiring structure formed in the lamination of insulator and connected to the semiconductor elements and the ferro-electric capacitors; pad electrodes connected to the wiring structure, formed in the lamination of insulator and exposed in the openings of the passivation film; a conductive pad protection film, including a Pd film, covering each pad electrode via the opening of the passivation film, and extending on the passivation film; and stud bump or bonding wire connected to the pad electrode via the conductive pad protection film.

Semiconductor device with pads of enhanced moisture blocking ability

A lower electrode film, a ferroelectric film, and an upper electrode film are formed on an insulation film covering a transistor formed on a semiconductor substrate. Furthermore, a Pt film is formed as a cap layer on the upper electrode film. Then, a hard mask (a TiN film and an SiOfilm) of a predetermined pattern is formed on the Pt film, and the Pt film and the upper electrode film are etched. Then, an insulating protective film is formed on an entire surface, and a side surface of the upper electrode film is covered with the insulating protective film. Next, the ferroelectric film and the lower electrode film are etched, thus forming a ferroelectric capacitor.

Method of manufacturing a FeRAM device

A ferroelectric capacitor comprising a transistor layer superimposed on a semiconductor substrate, a ferroelectric capacitor layer provided superior to the transistor layer, a wiring layer provided superior to the ferroelectric capacitor layer, and a passivation film. Further, at least one layer of barrier film capable of inhibiting penetration of moisture and hydrogen into the underlayer is provided between the ferroelectric capacitor layer and the passivation film, and the passivation film is characterized by containing a novolac resin.

Method of making ferroelectric memory device with barrier layer and novolac resin passivation layer

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Kawasaki, Japan

Kouichi Nagai