Hitachi, Ltd.

Hitachi-High-Technologies Corporation

Sony Computer Entertainment Inc.

Kouichi Hayakawa

Hiroyuki Shinada

Atsuko Takafuji

Yasuhiko Nara

Yasuhiro Gunji

Masaaki Nojiri

Masami Iizuka

Masayoshi Takeda

Masahiro Watanabe

Takashi Hiroi

Yukio Hagita

A processor processes the task A and the task B sequentially, wherein the task A performs an application to generate data that should be output to or input from an HDD, and the task B controls a data input and output request to the HDD controller.

Information processing method and apparatus using the same

The disclosed subject matter is related to a circuit pattern inspection apparatus for detecting a gradual changing of defect expanding over a large area of the semiconductor wafer. In order to detect a gradual changing of a defect related condition expanding over a large area of the semiconductor wafer, comparison is made between dies on a wafer that are separated from each other by a distance of at least one die width. For example, when a value according to a difference between such dies exceeds a pre-determined value, an existence of the gradual changing can be confirmed.

Circuit-pattern inspection apparatus

According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

Charged particle beam apparatus and automatic astigmatism adjustment method

In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.

Inspection apparatus for circuit pattern

Growing community of inventors

Hitachinaka, Japan

Kouichi Hayakawa