Macronix International Co., Ltd.

Microjet Technology Company, Ltd.

Kou-Yow Tseng

Ying-Lun Chang

Arnold Chang-Mou Yang

Tse-Chi Mou

Chin-Yi Chou

Wen-Cheng Lien

Hung-Chun Tsai

Shih-Liang Chou

Tsung-De Lin

Y Y Chang

Yee-Shyi Chang

Shiang-Ching Cheng

L H Lee

A rapid thermal annealing ('RTA') process providing for an RTA equipment is disclosed. The RTA equipment has a pyrometer providing for measuring an operation parameter, e.g., a temperature of the RTA process. The RTA process comprises steps of proceeding a first RTA step to a wafer in the RTA equipment, then comparing a measured value of the operation parameter with a reference range of value of the operation parameter, thereafter proceeding a second RTA step to the wafer in the RTA equipment when the measured value of the operation parameter is in between the reference range of value of the operation parameter. When the measured value of the operation parameter is out of the reference range of value of the operation parameter, the RTA equipment is turned off, and the wafer is unloaded from the RTA equipment and loaded into another RTA equipment to complete the RTA process.

Rapid thermal annealing process

A manufacturing process and a structure for an ink jet printhead with high quality, yield rate, and performance are provided. The process includes steps of: a) providing a substrate, b) forming a dielectric layer over the substrate, c) forming a resistor over the dielectric layer, d) forming a conducting layer over a portion of the resistor, e) forming a passivation over a portion of the conducting layer and another portion of the resistor not covered by the conducting layer, f) forming a hole over the passivation for storing an ink, and g) forming a nozzle over the hole for ejecting therethrough the ink.

Manufacturing process and structure of ink jet printhead

Growing community of inventors

Hsinchu, Taiwan

Kou-Yow Tseng