American Telephone & Telegraph Co., At&t Bell Laboratories

The United States of America As Represented by the Department of Commerce

Kou-Wei Wang

Implantation of a Group V ion species (e.g., phosphorus or arsenic) into an In-based Group III-V compound semiconductor (e.g., InP, InGaAs) followed by implantation of Be ions produces a shallow p-type surface layer and avoids significant in-diffusion of the dopant species. High carrier concentrations and activation efficiences are attained. The technique has application in the fabrication of FETs, APDs and ohmic contacts.

Group III-V compound semiconductor device having p-region formed by Be

Implantation of a Group V ion species (e.g., phosphorus or arsenic) into an In-based Group III-V compound semiconductor (e.g., InP, InGaAs) followed by implantation of Be ions produces a shallow p-type surface layer and avoids significant in-diffusion of the dopant species. High carrier concentrations and activation efficiencies are attained. The technique has application in the fabrication of FETs, APDs and ohmic contacts.

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Piscataway, NJ, United States of America

Kou-Wei Wang