Fujitsu Corporation

Kotaro Shirabe

Keiji Watanabe

Ei Yano

Takashi Maruyama

Eiichi Hoshino

Miwa Igarashi

Keiko Yano

Atsushi Takizawa

Masafumi Nakaishi

A calibration plate includes a first pattern in which bars and spaces are repeated, and a second pattern in which bars having an identical width to the spaces of the first pattern and spaces having an identical width to the bars of the first pattern are repeated, wherein the first pattern and the second pattern adjoin each other, and the bars and spaces of the first pattern and the bars and spaces of the second pattern are staggered.

Calibration plate having accurately defined calibration pattern

An electroconductive pattern is formed by coating a substrate with a solution comprising 100 parts by weight of a soluble electroconductive polymer containing an organic radical capable of cross-linking with a cross-linking agent, 5 to 1,000 parts by weight of a cross-linking agent, and 100 to 100,000 parts by weight of a solvent; effecting cross-linking of the resultant coated film to obtain a cured electroconductive film having a sheet resistance of 10.sup.10 .OMEGA./.quadrature. or less; forming a pattern as an upper layer on the cured electroconductive layer; and transferring the pattern of the upper layer to the cured electroconductive layer.

Processes for forming resist pattern and for producing semiconductor

Growing community of inventors

Kawasaki, Japan

Kotaro Shirabe