Gigaphoton Inc.

Kotaro Miyashita

Toru Suzuki

Yoshifumi Ueno

Takuya Ishii

An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes: a mirror configured to reflect extreme ultraviolet light; a wavelength filter configured to selectively transmit the extreme ultraviolet light reflected by the mirror; an optical sensor configured to detect the extreme ultraviolet light having transmitted through the wavelength filter; and a purge gas supply unit disposed to supply purge gas to a space between the wavelength filter and the optical sensor.

Extreme ultraviolet light sensor unit and extreme ultraviolet light generation apparatus

Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.

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Oyama, Japan

Kotaro Miyashita