Ebara Corporation

Kotaro Kawamura

Kazutaka Okuda

Takeshi Tsuji

Yuji Shirao

Rikiya Nakamura

Yoshiro Takemura

Yasutaka Muroga

Hiroyuki Yamada

Hiroyuki Arai

Tetsuo Komai

Tomonori Ohashi

Keiichi Ishikawa

Tadakazu Nishikawa

Makoto Kashiwagi

Toyoji Shinohara

Seiji Kashiwagi

Kazumasa Hosotani

Yoshio Takemura

A combustion-type exhaust gas treatment apparatus has a combustion treatment chamber for treating exhaust gas by combusting and decomposing the exhaust gas, a main burner for forming a flame in the combustion treatment chamber by supplying a mixture gas produced by premixing a fuel gas and an oxidizing gas, and a scraper for scraping off solid matters adhering to an inner wall of the combustion treatment chamber. The mixture gas is adjusted within combustion range and supplied to the main burner during treatment for treating the exhaust gas by combusting and decomposing the exhaust gas when the scraper is not in operation, and the mixture gas is adjusted outside combustion range and supplied to the main burner during treatment for treating the exhaust gas by combusting and decomposing the exhaust gas when the scraper is in scraping operation.

Combustion-type exhaust gas treatment apparatus

A combustion-type exhaust gas treatment apparatus is used to treat a harmful exhaust gas by combustion to render the gas harmless. The treatment apparatus includes a combustion treatment section, a cooling section, and a washing section. The combustion treatment section includes an exhaust-gas treatment combustor, a body made from metal and having a roughened inner surface, and a water-film formation mechanism adapted to form a water film on the inner surface of the body. The combustion treatment of the exhaust gas is performed in the body.

An exhaust gas cleaning apparatus according to the present invention includes a wall member configured to form a gas passage for allowing an exhaust gas to pass therethrough, and a mist nozzle and a water film nozzle disposed in the gas passage. The mist nozzle forms mist in the gas passage, and the water film nozzle forms water film in the gas passage. The mist nozzle is disposed further toward the upstream side in a flowing direction of the exhaust gas than the water film nozzle. Plural sets of the mist nozzle and the water film nozzle may be provided.

Exhaust gas cleaning apparatus

A scrubber removes dust from an exhaust gas. The scrubber includes a casing having an exhaust gas inlet and an exhaust gas outlet, an impeller housed in the casing and supported by a shaft, and a cleaning liquid supply tube for ejecting a cleaning liquid by which the dust contained in the exhaust gas is captured. The scrubber further includes a plurality of protrusions provided around the impeller such that the exhaust gas and the cleaning liquid which are discharged from the impeller impinge upon the protrusions.

Scrubber and exhaust gas treatment apparatus

The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiHand a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiOto be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (), which is open toward a combustion chamber (), surrounded by a peripheral wall (), and closed by a plate () remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (), and the mixed gases are ejected toward the combustion chamber () perpendicularly to the plate ().

Burner for treating waste gas

A waste gas treatment system having a burner part and a combustion chamber provided at a downstream side of the burner part. Combustion flames are formed from the burner part toward the combustion chamber, and a waste gas is introduced into the combustion flames, thereby oxidatively decomposing the waste gas. The combustion chamber is formed from an inner wall made of a fiber-reinforced ceramic material. Therefore, the wear of the inner wall due to heat and corrosion is minimized, and thermal stress cracking is also reduced. Consequently, the lifetime of the system increases, and the cost of equipment and the availability factor can be improved. In addition, because the inner wall exhibits no catalytic effect, the formation of thermal NOx is suppressed, and it is possible to achieve environmental preservation and to simplify the treatment equipment.

Exhaust gas treating device

The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone ( ), which is open toward a combustion chamber ( ), surrounded by a peripheral wall ( ), and closed by a plate ( ) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone ( ), and the mixed gases are ejected toward the combustion chamber ( ) perpendicularly to the plate ( ).

Growing community of inventors

Tokyo, Japan

Kotaro Kawamura