Jsr Corporation

Kota Nishino

Ken Maruyama

Hirokazu Sakakibara

Hayato Namai

Daisuke Shimizu

Toshiyuki Kai

Kazuki Kasahara

A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), Rrepresents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that Rin the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that Rin the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group. 

Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound

A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Zrepresents a monovalent anion shown by a general formula (2), Mrepresents a monovalent onium cation, Rrepresents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.

Radiation-sensitive resin composition and compound

A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). Rrepresents a hydrogen atom or a methyl group. Each Rindependently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q&#x2266;5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.

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Tokyo, Japan

Kota Nishino