Canon Kabushiki Kaisha

Nuflare Technology, Inc.

Kota Iwasaki

Masafumi Kyogaku

Yohei Murayama

Taku Yamada

Yasue Sato

Makoto Kojima

Hiroyuki Hashimoto

Yoichi Ando

Hidetoshi Tsuzuki

Yoichi Otsuka

Kiminobu Akeno

Michihiro Kawaguchi

Takayuki Sekine

Naofumi Aoki

Keita Ideno

Kiyoshi Nakaso

Keisuke Goto

Hitoshi Matsushita

Shintaro Yamamoto

Jumpei Naito

Ryota Inoue

Yuki Fukuda

A multi-electron beam writing apparatus includes a light source array to include plural light sources and generate plural first lights, a multi-lens array to include plural first lenses, and to divide the plural first lights into plural second lights by that each of the plural first lights illuminates a corresponding lens set of plural lens sets each composed of plural second lenses being a portion of the plural first lenses and by that each of lenses, being at least a part of the plural second lenses, is irradiated with two or more first lights of the plural first lights, a photoemissive surface to receive the plural second lights through its upper surface, and emit multiple photoelectron beams from its back surface, and a blanking aperture array mechanism to perform an individual blanking control by individually switching between ON and OFF of each of the multiple photoelectron beams.

Multi-electron beam writing apparatus and multi-electron beam writing method

According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

Electron beam irradiation apparatus and electron beam irradiation method

A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.

Multiple electron beam writing apparatus and multiple electron beam writing method

A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.

Charged particle beam irradiation apparatus

An information processing device configured to process spectral information includes: a data obtaining unit configured to obtain three-dimensional distribution data of spectral information; a generating unit configured to generate two-dimensional image, data from the three-dimensional distribution data of spectral information; a display unit; a display control unit configured to display the two-dimensional image on the display unit; an information obtaining unit configured to obtain position information of a two-dimensional region which a user has selected from the two-dimensional image; and an extracting unit configured to extract, from a three-dimensional region corresponding to the two-dimensional region, in the three-dimensional distribution of spectral information, feature region information satisfying predetermined feature conditions.

Information processing device to process spectral information, and information processing method

A charged particle image measuring device includes a sample stage, a charged particle lens opposite the sample stage, a two-dimensional detector, a first diaphragm disposed between the sample stage and a position of a crossover that is formed by the charged particle lens and that is closest to a sample, and a second diaphragm disposed between the first diaphragm and the two-dimensional detector.

Charged particle image measuring device and imaging mass spectrometry apparatus

A spectral data processing apparatus includes an analyzer configured to perform principal component analysis of spectral data acquired for each of a plurality of regions of a sample, wherein the analyzer obtains an eigenvector by performing the principal component analysis of first spectral data of a first region out of the plurality of regions, and performs the principal component analysis of second spectral data of a second region different from the first region out of the plurality of regions using the obtained eigenvector.

Spectral data processing apparatus, spectral data processing method, and recording medium

Provided is a projection-type charged particle optical system in which a projection magnification can be changed while a decrease in the accuracy in measuring a mass-to-charge ratio is being suppressed. A projection-type charged particle optical system according to the present invention includes a first electrode disposed so as to face a sample and having an opening formed therein for allowing a charged particle to pass, a second electrode disposed on a side of the first electrode opposite to where the sample is disposed and having an opening formed therein for allowing the charged particle to pass, and a flight-tube electrode disposed such that the charged particle that has been emitted from the sample and has passed through the second electrode enters the flight-tube electrode and being configured to form a substantially equipotential space thereinside. A principal plane is formed at at least two positions in a travel path of the charged particle.

Projection-type charged particle optical system and imaging mass spectrometry apparatus

To provide a mass spectrometer capable of performing high-sensitivity measurement using water molecules. The mass spectrometer has a chamber in which a sample is disposed, an irradiation unit for emitting particles to the sample, and an extraction electrode which leads secondary ions emitted from the sample to a mass spectrometry unit, in which the irradiation unit switches a first mode of emitting primary ions for causing the secondary ions to be emitted from the sample and a second mode of emitting particles containing water molecules to be made to adhere to the sample and emits the particles to the sample.

Mass spectrometer and mass image analyzing system

A spectral image data processing apparatus which conducts multivariate analysis on spectral image data of a sample, including: a region setting unit configured to set a region of interest for performing multivariate analysis in a sample in which a difference needs to be distinguished, the region of interest being set in accordance with spectral image data of the sample; and an analysis unit configured to perform the multivariate analysis with spectral image data inside the region of interest and spectral image data of region of non-interest which is a region other than the region of interest being distinguished from each other.

Spectral image data processing apparatus and two-dimensional spectral apparatus

The present invention provides a mass distribution spectrometry which reduces an influence of the dispersion in the times at which ionizing beams irradiate a sample, on a mass spectrometry result, and can measure the mass distribution with high reliability. The mass distribution spectrometry is a mass spectrometry which includes irradiating the sample with a primary ion beam and detecting generated secondary ions, wherein this primary ion beam has a spread toward a direction perpendicular to a travelling direction, has a path length of each primary ion contained in the primary ion beam between a primary ion source and a surface of the sample adjusted by deflecting a trajectory, and is obliquely incident on the surface of the sample.

Mass distribution spectrometry method and mass distribution spectrometer

An optical measurement device includes a light source unit including a first laser light source configured to emit a laser beam having a first wavelength and a second laser light source configured to emit a laser beam having a second wavelength, a measurement wave number setting unit, and a light source adjustment unit configured to adjust at least one of the first wavelength and the second wavelength such that a difference between or a sum of a first wave number corresponding to the first wavelength and a second wave number corresponding to the second wavelength matches a measurement wave number set through the measurement wave number setting unit.

Light source adjustment unit, optical measurement device, subject information obtaining system, and wavelength adjustment program

The present invention provides an ion group irradiation device which includes: an ion source which generates an ion; and an ion group selecting unit which selects an ion group containing a cluster ion from ions released from the ion source, in an ion group irradiation device for irradiating a sample with the ion group, wherein the ion source has a pressure gradient forming unit for changing a pressure with which a material of the cluster ion is jetted, with time, the ion group selecting unit has a chopper which performs a chopping operation of selecting the ion group by passing and blocking the cluster ions in a traveling direction by the opening and closing of the chopper, and the chopper performs two or more times of the chopping operations per one time of a pressure gradient forming operation by the pressure gradient forming unit.

Ion group irradiation device and secondary ion mass spectrometer

When a time-of-flight mass selector having a chopper using a deflector selects the masses of the ions, an ion beam is deflected. As a result, at least a part of the ion beams diagonally pass through an aperture electrode with respect to the axis. Accordingly, there has been a problem that a position on an object irradiated with a cluster ion beam, results in moving. This mass selector includes: a flight tube having an equipotential space that makes a charged substance fly therein; a deflector that is installed in a downstream side with respect to the flight tube in a direction in which the charged substance flies; a first aperture electrode that is installed in a downstream side with respect to the deflector in a direction in which the charged substance flies; and a second aperture electrode that is installed in between the deflector and the first aperture electrode.

Growing community of inventors

Atsugi, Japan

Kota Iwasaki