Canon Nanotechnologies, Inc.

Eastman-Kodak Company

Molecular Imprints, Inc.

Canon Kabushiki Kaisha

Applied Science Fiction, Inc.

Kosta S Selinidis

Richard A Patterson

Joseph Benjamin Gault

Homero Saldana

Byung-Jin Choi

Frank Y Xu

Niyaz Khusnatdinov

Dwayne L LaBrake

Leland A Lester

Eric C Segerstrom

Steven Kent Brown

Stacy S Cook

Ecron D Thompson

Michael R Thering

Paul N Winberg

Joseph Michael Imhof

Patrick W Lea

John J Straigis

G Gregory Mooty

William D Mapel

Sidlgata V Sreenivasan

Gerard M Schmid

Mario Johannes Meissl

Weijun Liu

Anshuman Cherala

Edward Brian Fletcher

Byung Jin Choi

Ian Matthew McMackin

Steven C Shackleton

Paul E Pergande

Douglas J Resnick

Zhengmao Ye

Douglas E Corbin

Yeong-Jun Choi

Andrew Robert Eckert

Alexei L Krasnoselsky

Jamie M Kropka

Lorin C Nash

Gaddi S Haase

Jonathan D Isom

An imprint lithography template including an alignment mark including at least two columns or at least two rows of features spaced apart from one another, and a dummy-fill region, wherein the alignment mark is spaced apart from the dummy-fill region, and wherein a closest distance between the at least two columns or the at least two rows is less than a closest distance between any portion of the at least two columns or the at least two rows and the dummy-fill region. In an embodiment, the at least two columns or the at least two rows are spaced apart by at least 0.5 microns. In a further embodiment, the closest distance between the at least two columns or the at least two rows and the dummy-fill region is at least 2 microns.

Imprint lithography template, system, and method of imprinting

Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.

Imprint lithography template and method for zero-gap imprinting

An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.

Porous template and imprinting stack for nano-imprint lithography

Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.

Imprint lithography template

Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.

Optically absorptive material for alignment marks

Described are systems and methods for formation of templates having alignment marks with high contrast material. High contrast material may be positioned within recesses of alignment marks.

Templates having high contrast alignment marks

Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.

High contrast alignment marks through multiple stage imprinting

Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.

Template having alignment marks formed of contrast material

An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.

Template having a silicon nitride, silicon carbide or silicon oxynitride film

A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.

Film processing solution cartridge and method for developing and digitizing film

Photographic media developer cartridge

Photofinishing system maintenance cartridge

An aqueous developer solution for use in digital film processing. The developer solution includes a developing agent and at least one surfactant or thickener. A method of processing a photographic film is also provided, and includes the steps of coating an aqueous developer solution containing at least one surfactant or thickener onto the film, thereby developing the film, and scanning the film through the coating of developer solution.

Digital film processing solutions and method of digital film processing

Growing community of inventors

Austin, TX, United States of America

Kosta S Selinidis