Tokyo Ohka Kogyo Co., Ltd.

Koshi Onishi

Masatoshi Arai

Takaya Maehashi

Yoshitaka Komuro

KhanhTin Nguyen

Masahito Yahagi

Takuya Ikeda

Yuta Iwasawa

Yosuke Suzuki

Takahiro Kojima

Tasuku Matsumiya

Junichi Miyakawa

Masahiro Shiosaki

A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or the like, Rxrepresents an acid dissociable group, Rand Rrepresents an aryl group having a fluorine atom, R, R, and Rrepresents an aryl group or the like which may have a substituent, and Xand Xrepresents a counter anion

Resist composition and method of forming resist pattern

A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or the like, Rxrepresents an acid dissociable group, Mrepresents an m-valent organic cation, and Rrepresents a substituent

A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, which contains a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or a divalent linking group, Rarepresents a cyclic acid dissociable group, q represents an integer in a range of 0 to 3, and n represents an integer of 1 or more, provided that n&#x2264;q&#xd7;2+4 is satisfied

Resist composition, method of forming resist pattern, compound, and resin

A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rxto Rxrepresents a hydrogen atom or a hydrocarbon group, or two or more of Rxto Rxmay be mutually bonded to form a ring structure; Ryand Ryrepresents a hydrogen atom or a hydrocarbon group, or Ryand Rymay be mutually bonded to form a ring structure; Rzto Rzrepresents a hydrogen atom or a hydrocarbon group, or two or more of Rzto Rzmay be mutually bonded to form a ring structure; provided that at least one of Rxto Rx, Ry, Ryand Rzto Rzhas an anionic group; and Mrepresents an m-valent organic cation).

A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Rarepresents an acid dissociable group; R, Rand Reach independently represents a hydrocarbon group containing an aromatic ring; R, Rand Reach independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; Rrepresents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M'represents an m-valent onium cation. 

A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Varepresents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Yarepresents a carbon atom; Xarepresents a group which forms a cyclic hydrocarbon group together with Ya; Rarepresents a hydrocarbon group which may have a substituent; provided that at least one of Xaand Rahas a carbon atom constituting a carbon-carbon unsaturated bond at an &#x3b1;-position of Ya. 

Resist composition, method of forming resist pattern, polymeric compound, and compound

A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Rarepresents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Rais an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Rais a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Rais bonded; and when Rais an alkyl group, Rais a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom. 

A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, Rand Rare each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Vais a divalent hydrocarbon group which may have an ether bond, nis an integer of 0 to 2, Rais a tertiary alkyl ester-type acid dissociable group, Vais a divalent linking group containing a heteroatom, or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, Rais an acid dissociable group, and nis an integer of 1 to 3. 

Method of preparing polymer compound

A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Vaand Vaare a divalent hydrocarbon group, nand neach are an integer of 0 to 2, Ra&#x2033; is a specific acid dissociable group, Vais a divalent linking group containing a hetero atom or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, and nis an integer of 1 to 3. 

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Kawasaki, Japan

Koshi Onishi