Asml Netherlands B.v.

Koos Van Berkel

Ferry Zijp

Duygu Akbulut

Jeroen Johan Maarten Van De Wijdeven

Adrianus Hendrik Koevoets

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Jim Vincent Overkamp

Sietse Thijmen Van Der Post

Peter Danny Van Voorst

Johannes Adrianus Cornelis Maria Pijnenburg

Mauritius Gerardus Elisabeth Schneiders

Kjeld Gertrudus Hendrikus Janssen

Johannes Bernardus Charles Engelen

Christiaan Alexander Hoogendam

Marcus Adrianus Van De Kerkhof

Raymond Wilhelmus Louis Lafarre

Frits Van Der Meulen

Harmen Klaas Van Der Schoot

David Ferdinand Vles

Arnoud Willem Notenboom

Gosse Charles De Vries

Sander Catharina Reinier Derks

Johannes Hubertus Antonius Van De Rijdt

Matthias Kruizinga

Martinus Agnes Willem Cuijpers

Marinus Johannes Maria Van Dam

Christiaan Louis Valentin

Peter Van Delft

Hendrikus Herman Marie Cox

Jacobus Cornelis Gerardus Van Der Sanden

Stan Henricus Van Der Meulen

Alain Louis Claude Leroux

Jeroen Van Duivenbode

Johan Maria Van Boxmeer

Tammo Uitterdijk

Oleksiy Galaktionov

Erik Johan Arlemark

Dries Vaast Paul Hemschoote

Ronald Cornelis Gerardus Gijzen

Patrick Willem Paul Limpens

Wenjie Jin

Roger Franciscus Mattheus Maria Hamelinck

Marinus Augustinus Christiaan Verschuren

Joost De Hoogh

Evert Auke Rinze Westerhuis

Shahab Shervin

Victor Sebastiaan Dolk

Erik Johannes Nieuwenhuis

Paul Comé Henri De Wit

The invention provides a method for thermo-mechanical control of a heat sensitive element (MI) subject to a heat load, comprising: —providing a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between characteristics of the heat load and deformation of the heat sensitive element; —calculating a control signal on the basis of an optimization calculation of the non-linear model, —providing an actuation signal to a heater (HE), wherein the actuation signal is at least partially based on the control signal, —heating the heat sensitive element by the heater on the basis of the actuation signal.

Method for thermo-mechanical control of a heat sensitive element and device for use in a lithographic production process

A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.

Method and apparatus for calculating a spatial map associated with a component

An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

Object holder, electrostatic sheet and method for making an electrostatic sheet

An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

Object holder, tool and method of manufacturing an object holder

A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.

Multilayer reflector, method of manufacturing a multilayer reflector and lithographic apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

An optical system and detector capture a distribution of radiation modified by interaction with a target structure. The observed distribution is used to calculate a property of the structure (e.g. CD or overlay). A condition error (e.g. focus error) associated with the optical system is variable between observations. The actual condition error specific to each capture is recorded and used to apply a correction for a deviation of the observed distribution due to the condition error specific to the observation. The correction in one practical example is based on a unit correction previously defined with respect to a unit focus error. This unit correction can be scaled linearly, in accordance with a focus error specific to the observation.

Method of determining a property of a structure, inspection apparatus and device manufacturing method

Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.

Method of optimizing the position and/or size of a measurement illumination spot relative to a target on a substrate, and associated apparatus

A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

Method and apparatus for inspection and metrology

A method and apparatus for position control of a component relative to a surface is disclosed. The method may include calculating an estimated effect of, or derived from, Casimir force acting between the component and the surface, and compensating positioning of the component relative to the surface using the estimated effect.

A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

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Waalre, Netherlands

Koos Van Berkel