Kla Tencor Corporation

Konstantin Tsigutkin

Alexander Bykanov

Rudy Flores Garcia

Daniel C Wack

Oleg Khodykin

Frank Chilese

Layton Hale

Brian Ahr

Joseph Walsh

An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

System and method for generation of extreme ultraviolet light

A pulsed laser system includes a variable attenuator located in a secondary optical path bounded by a target surface and one or more reflective surfaces outside of the primary laser oscillator of the laser system. The variable attenuator isolates an output optical amplifier of the laser system from light reflected from the target during time periods between laser pulses. In some embodiments, the variable attenuator is synchronously controlled with the primary laser oscillator. In some other embodiments, the variable attenuator is controlled separately from the primary laser oscillator to shape the generated laser pulses.

Suppression of parasitic optical feedback in pulse laser systems

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San Diego, CA, United States of America

Konstantin Tsigutkin