Asml Netherlands B.v.

Konstantin Tsigutkin

Markus Gerardus Martinus Maria Van Kraaij

Willem Marie Julia Marcel Coene

Nitish Kumar

Richard Quintanilha

A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

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Eindhoven, Netherlands

Konstantin Tsigutkin