Asml Netherlands B.v.

Isteq B.v.

Rnd-isan. Ltd

Isteq Group Holding B.v.

Ooo “Rnd-Isan”

Ooo “Isteq B.v.”

Konstantin Nikolaevich Koshelev

Vadim Yevgenyevich Banine

Vladimir Mikhailovich Krivtsun

Aleksandr Andreevich Lash

Vladimir Vitalievich Ivanov

Aleksandr Yurievich Vinokhodov

Vyacheslav Valerievich Medvedev

Vladimir Vitalevich Ivanov

Oleg Feliksovich Yakushev

Samir Ellwi

Mikhail Sergeyevich Krivokorytov

Yury Viktorovich Sidelnikov

Vladimir Mihailovitch Krivtsun

Oleg Borisovich Khristoforov

Pavel Stanislavovich Antsiferov

Denis Aleksandrovich Glushkov

Denis Alexandrovich Glushkov

Yurii Victorovitch Sidelnikov

Oleg Yakushev

Vladimir Vitalevitch Ivanov

Evgeny Dmitrievich Korop

Arno Jan Bleeker

Johannes Hubertus Josephina Moors

Johannes Christiaan Leonardus Franken

Alexander Matthijs Struycken

Kurt Gielissen

Dmitriy Victorovich Lopaev

Vladimir Vital'evich Ivanov

Vladimir Mihallovitch Krivtsun

Mikhail Sergeyevich Kryvokorytov

Givi Georgievich Zukakishvili

Pavel Viktorovich Seroglazov

A laser produced plasma light source comprises a vacuum chamber with a rotating target assembly supplying a target into an interaction zone with focused laser beam. The target is layer of a fluid and/or free-flowing target material on a surface of annular groove in the rotating target assembly. An output beam of short-wavelength radiation exits the interaction zone to an optical collector through the means for debris mitigation. A linear velocity of the target is not less than 100 m/s and a vector of the linear velocity of the target in the interaction zone is directed on one side of a plane passing through the interaction zone and the rotation axis while the focused laser beam and the output beam are located on another side of said plane. The optical collector comprises two ellipsoidal mirror units arranged in a tandem.

High-brightness laser produced plasma source and method of generation and collection radiation

An X-ray beam is generated in an interaction zone of an electron beam and a target, the zone being an annular layer of a molten fusible metal in an annular channel of a rotating anode assembly. The channel has a surface profile which prevents slopping of the molten metal in the radial direction and in both directions along the rotation axis. The liquid-metal target forms a circular cylindrical surface due to the centrifugal force acting thereupon. The linear velocity of the target is preferably higher than 80 m/s; in a vacuum chamber, a changeable membrane made of carbon nanotubes is installed in the X-ray beam path and a protective screen with apertures for electron beam entry and X-ray beam exit is arranged around the interaction zone. The technical result consists in an X-ray source with increased power, brightness, lifetime and ease of use.

X-ray source with rotating liquid-metal target

A radiation source contains a collector module comprising an optical collector, positioned in a vacuum chamber with an emitting plasma, further comprising a means for debris mitigation which include at least two casings arranged to output debris-free homocentric beams of the short-wavelength radiation, coming to the optical collector preferably consisting of several identical mirrors. Outside each casing there are permanent magnets that create a magnetic field inside the casings to mitigate charged fraction of debris particles and provide the debris-free homocentric beams of short-wavelength radiation. Other debris mitigating techniques are additionally used. Preferably the plasma is laser-produced plasma of a liquid metal target supplied by a rotating target assembly to a focus area of a laser beam. The technical result of the invention is the creation of high-powerful high-brightness debris-free sources of short-wavelength radiation with large, preferably more than 0.25 sr, collection solid angle.

Short-wavelength radiation source with multisectional collector module and method of collecting radiation

Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45&#xb0; to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.

High brightness laser-produced plasma light source

High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber () with an input window () for a laser beam () focused into the interaction zone (), an output window () for the exit of the short-wavelength radiation beam (); the rotating target assembly (), having an annular groove (); the target () as a layer of a molten metal formed by centrifugal force on the surface of the distal wall () of the annular groove () while the proximal wall () of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.

High-brightness laser produced plasma source and methods for generating radiation and mitigating debris

High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.

High brightness short-wavelength radiation source (variants)

The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180&#xb0; C. may be adjusted around the target jet.

High-brightness LPP EUV light source

The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber, and an optical system for collecting plasma radiation.

Light source with laser pumping and method for generating radiation

Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and determined radiation power is maintained via an automated control system.

A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Lithographic apparatus

A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.

Lithographic apparatus and device manufacturing method

An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Apparatus with plasma radiation source and method of forming a beam of radiation

A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus

An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

Growing community of inventors

Troitsk, Russia

Konstantin Nikolaevich Koshelev