Schott Ag

Carl-zeiss-smt Ag

Schott Glas

Konrad Knapp

Udo Dinger

Jochen Alkemper

Martin Letz

Ina Mitra

Lutz Parthier

Martin Weiser

Gunther Wehrhan

Regina Martin

Frank Eisert

Joerg Staeblein

Klaus Petermann

Hans Morian

Ulf Schniering

Volker Seibert

The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granet, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of YAlO, LuAlO, CaAlSiO, KNaAlF, KNaScF, KLiAlFand/or NaAlLiF, (Mg, Zn)AlO, CaAlO, CaBOand/or LiAlO, BaZrOand/or CaCeO. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.

Method for making optical elements for microlithography, the lens systems obtained by the method and their uses

There is provided a substrate material for an optical component for X-rays of wavelength &#x3bb;. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 &#x3bb;. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5&#xd7;10Kin a temperature range of about 20 &#xb0;C. to 100&#xb0;C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about &#x3bb;/30 rms.

Substrate material for X-ray optical components

An apparatus is used to make microchips in which monochromatic light issuing from a light source is guided to a photomask that is held in a predetermined position in which the monochromatic light rays are combined with a lens system and directed to a wafer. The supporting plate is a rectangular plate made from glass or glass-ceramic material that has a receptacle for holding the photomask. In order to provide a supporting plate according to the invention with weight that is as small as possible and with a dynamic stiffness as high as possible, the rectangular plate is provided with front-edge elongated blind holes extending in side edge regions along both long edges of the rectangular plate in the plane of the plate, as well as with other recesses. The elongated blind holes are preferably thin-walled and have a box-like shape.

Supporting plate for a photomask in an apparatus for making a microchip

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Mainz, Germany

Konrad Knapp