Showa Denko K.k.

Resonac Corporation

Komomo Tani

Tatsuo Fujimoto

Kazuhito Kamei

Kazuhiko Kusunoki

Hiroshi Tsuge

Kazuaki Seki

Takayuki Yano

The present invention provides a method of raising the rate of reduction of the dislocation density accompanying growth of an SiC single crystal to counter the increase in the threading screw dislocations formed near the interface of the seed crystal and grown SiC single crystal and thereby produce an SiC single-crystal ingot with a small threading screw dislocation density from the initial stage of growth. The present invention is a method for producing a silicon carbide single-crystal ingot growing a silicon carbide single crystal on a growth face of a seed crystal consisting of a silicon carbide single crystal by a physical vapor transport method so as to produce a silicon carbide single-crystal ingot, the method for producing a silicon carbide single-crystal ingot comprising forming step bunching with heights of steps of 10 &#x3bc;m to 1 mm and spans of terraces of 200 &#x3bc;m to 1 mm on the growth face of the seed crystal and making the silicon carbide single crystal grow on the growth face of the seed crystal by the physical vapor transport method.

Method for producing silicon carbide single-crystal ingot and silicon carbide single-crystal ingot

Growing community of inventors

Tokyo, Japan

Komomo Tani