Tokyo Electron Limited

Koki Yoshimura

Taro Yamamoto

Yasushi Takiguchi

Hideharu Kyouda

Masahiro Fukuda

Yoshinori Ikeda

Koshi Muta

Yoshiki Okamoto

Shogo Takahasi

Satoshi Nakakido

A liquid processing apparatus includes: a stage; a cup that surrounds a substrate placed on the stage; a processing liquid supplier that supplies a processing liquid to the substrate; an exhaust port provided in the cup to exhaust the cup; an annular body provided inside the cup to surround the substrate and form a flow path for a gas flowing into the cup; a lifting mechanism that raises or lowers the annular body relative to the cup to perform a switching between a first state in which the annular body is located at a first relative height to perform a first exhaust and a second state in which the annular body is located at a second relative height to perform a second exhaust; and a drainage port that opens to an upstream side of the exhaust port in each of the first and second flow paths.

Liquid processing apparatus and liquid processing method

A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.

Liquid processing apparatus

Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.

The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.

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Koshi, Japan

Koki Yoshimura