Mitsubishi Electric Corporation

Tokyo Electron Limited

Nec Corporation

Nippon Electric Co., Ltd.

Mitsubishi Denki Kabushiki Kaisha

Jfe Steel Corporation

Sega Corporation

Mitsumi Electric Company Ltd.

Mitsubishi Paper Mills Limited

Tokyo Electron Limi Ted

National Institute of Information and Communications Technology, Incorporated Administrative Agency

Mitsubishi Electric Company

Hirakawa Kogyo Sha Co., Ltd.

Koji Yamashita

Hiroyuki Morimoto

Shinichi Wakamoto

Naofumi Takenaka

Takeshi Hatomura

Yuji Motomura

Katsuhiro Ishimura

Yusuke Shimazu

Kazuya Watanabe

Takashi Okazaki

Naoki Tanaka

Soshi Ikeda

Osamu Morimoto

Kosuke Tanaka

Mamoru Hamada

Tetsuya Yamashita

Koji Tanaka

Hironobu Hyakutake

Kotaro Tsurusaki

Masaki Kobayashi

Fumitake Unezaki

Yasunori Tanaka

Tomohiko Kasai

Keisuke Takayama

Yoshihiro Sumida

Shigeo Takata

Hirofumi Koge

Satoshi Ueyama

Mitsunori Nakamori

Akira Morikawa

Naomichi Tamura

Keisuke Hokazono

Yosuke Kawabuchi

Jun Nishio

Tadashi Ariyama

Kouzou Kanagawa

Takuro Masuzumi

Kazuya Koyama

Takumi Honda

Katsuhiko Hayashida

Eiji Hagimoto

Junichi Ue

Hiroto Nakao

Kouyou Miyawaki

Kohei Ogura

Shinji Tahara

Yusuke Otsubo

Makoto Saito

Hideaki Abe

Takashi Oda

Hiroaki Makino

Masaki Toyoshima

Takashi Oyamada

Toshihide Koda

Koji Akiyama

Hiroaki Inadomi

Masami Yamashita

Yusuke Tashiro

Mika Fujii

Fumihiko Ishizono

Hisatoshi Fukumoto

Hitoshi Kosugi

Susumu Yoshimura

Hiroshi Nakata

Satoru Yanachi

Kiyoaki Tsumura

Takao Inada

Toshio Takeuchi

Koichi Nagata

Takeshi Sugimoto

Keisuke Egashira

Yoshinori Shirafuji

Kenichi Matsumura

Kouzou Tachibana

Yoshiteru Fukuda

Hitoshi Kagawa

Kenji Ohgiyama

Tsukasa Hirayama

Yoshitsugu Tanaka

Takeyuki Maegawa

Yasushi Akasaka

Toshiyuki Shiokawa

Hiroyuki Masutomi

Kotaro Ooishi

Takeshi Izawa

Mitsuru Yamazaki

Takashi Ikeda

Yasushi Akahori

Yusuke Yamamoto

Hirokazu Higashijima

Hidekazu Kubota

Asako Tamura

Susumu Ishida

Kenji Kan

Shozou Maeda

Shingo Kamitomo

Jyunichi Ue

Fumio Matsuoka

Toyoaki Nishida

Tomohiro Fukuhara

A moving inspection device capable of realizing significant size reduction/weight reduction without affecting the inspection performance for an inspection target, a moving inspection method, and a method for manufacturing a steel material. A moving inspection device includes: a moving inspection device body configured to inspect an inspection target for defects while moving over a surface of the inspection target; and water supply devices separate from the body and configured to supply water required for the inspection onto the surface of the inspection target. The body is installed with a flow adjustment plate configured to push out the water supplied onto the surface of the inspection target from the water supply devices in the advancing direction and form streamlines for supplying the water between inspection sensors configured to inspect the inspection target for defects and the surface of the inspection target simultaneously with the movement of the body.

Moving inspection device, moving inspection method, and method for manufacturing steel material

A moving inspection device inspecting an inspection target while realizing the simplification of the configuration and significant size reduction/weight reduction of the device, a moving inspection method, and a method for manufacturing a steel material. The device includes a moving inspection device body configured to inspect an inspection target for defects while moving over its surface. The moving inspection device body includes: a carriage that moves by at least two wheels that rotate forward and backward over the surface; and at least one inspection sensor on the front end side or the rear end side of the carriage. An inspection region of the inspection target is divided into two divided regions across a straight line, and the carriage is configured to move when the inspection sensor is directed to side edges sides of the divided regions facing the straight line in each of the two divided regions.

A substrate processing apparatus includes a processing tank, a holder, an organic solvent supply, a drainage port, a gas supply, and an exhaust port. The processing tank stores an aqueous layer. The holder holds a substrate. The organic solvent supply supplies an organic solvent onto the aqueous layer to form a liquid layer of the organic solvent. The drainage port discharges the aqueous layer from a bottom wall of the processing tank and causes the liquid layer of the organic solvent to descend from above the substrate to below the substrate. The gas supply supplies a gas of a water repellent agent to the liquid layer from above the processing tank while the liquid layer descends. The exhaust port is exposed on a side wall of the processing tank by the descending of the liquid layer and discharges the gas of the water repellent gas.

Substrate processing apparatus for supplying gas of water repellent agent and substrate processing method

Substrates can be suppressed from being separated from supporting grooves. A substrate processing apparatus includes a substrate holding unit and a processing tub. The substrate holding unit is configured to hold multiple substrates. The processing tub is configured to store a processing liquid therein. The substrate holding unit comprises a supporting body, an elevating device and a restriction unit. The supporting body has multiple supporting grooves and is configured to support the multiple substrates with a vertically standing posture from below in the multiple supporting grooves, respectively. The elevating device is configured to move the supporting body between a standby position above the processing tub and a processing position within the processing tub. The restriction unit is configured to be moved up and down along with the supporting body by the elevating device and configured to restrict an upward movement of the substrates with respect to the supporting body.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to a position above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates that are exposed from the liquid surface. The controller changes an ejection flow rate of the vapor ejected by the ejector as the plurality of substrates are moved up.

Substrate processing apparatus, substrate processing method, and storage medium

A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates exposed from the liquid surfaces. The controller moves up the ejection position of the vapor of the organic solvent by the ejection unit as the plurality of substrates are moved up.

A substrate liquid treatment apparatus includes an inner tank configured to store a treatment liquid and having an upper opening, an outer tank disposed outside the inner tank, and a lid movable between a close position for closing the upper opening of the inner tank and an open position for opening the upper opening of the inner tank. The lid includes a main portion that covers the upper opening of the inner tank when the lid is positioned at the close position, and a splash shielding portion connected to the main portion. When the lid is positioned at the close position, the splash shielding portion extends from a position higher than an upper end of a side wall of the inner tank adjacent to the splash shielding portion to a position which is lower than the upper end of the side wall and which is on the outer tank side of the side wall.

Substrate liquid treatment apparatus

An air-conditioning apparatus includes a refrigeration circuit, a first shut-off device, a leakage detection device, and a controller configured to perform a refrigerant recovery operation in a case where refrigerant leakage is detected. At the time of the refrigerant recovery operation, the controller performs control to perform a first operation of recovering refrigerant from a load-side heat exchanger into an accumulator and a heat-source-side heat exchanger, and a second operation of moving refrigerant in the heat-source-side heat exchanger to the accumulator. In the first operation, the first shut-off device is closed, a flow passage switching device is brought into a first connection state, and a compressor is driven. The second operation is performed after the first operation, and in the second operation, the connection state of the flow passage switching device is switched to a second connection state in a state where the compressor is being operated.

Air-conditioning apparatus

An air-conditioning apparatus includes a refrigeration circuit, a first shut-off device provided at a pipe connecting a heat-source-side heat exchanger and an expansion device, a refrigerant leak detection device, and a controller. The controller controls a flow switching device to switch a connection state between a first connection state in which a discharge side of a compressor is connected to the heat-source-side heat exchanger, and a second connection state in which a suction side of the compressor is connected to the heat-source-side heat exchanger via an accumulator. When a refrigerant leak is detected, the controller performs a refrigerant retrieval operation and a refrigerant transfer operation.

Air-conditioning apparatus with leak detection control

Substrates can be suppressed from being separated from supporting grooves. A substrate processing apparatus includes a substrate holding unit and a processing tub. The substrate holding unit is configured to hold multiple substrates. The processing tub is configured to store a processing liquid therein. The substrate holding unit includes a supporting body, an elevating device and a restriction unit. The supporting body has multiple supporting grooves and is configured to support the multiple substrates with a vertically standing posture from below in the multiple supporting grooves, respectively. The elevating device is configured to move the supporting body between a standby position above the processing tub and a processing position within the processing tub. The restriction unit is configured to be moved up and down along with the supporting body by the elevating device and configured to restrict an upward movement of the substrates with respect to the supporting body.

Substrate processing apparatus and substrate processing meihod

Disclosed is a liquid processing method of drying a substrate held horizontally after supplying deionized water to the substrate. The liquid processing method includes: supplying the deionized water to a front surface of the substrate; supplying a first solvent to the front surface of the substrate after supplying the deionized water; supplying a water-repellent agent to the front surface of the substrate to impart water-repellency to the front surface of the substrate; supplying a second solvent to the front surface of the substrate to which water-repellency is imparted; and removing the second solvent from the front surface of the substrate. A specific gravity of the first solvent is smaller than a specific gravity of the water-repellent agent, and a specific gravity of the second solvent is larger than the specific gravity of the water-repellent agent.

Liquid processing method, substrate processing apparatus, and storage medium

An air-conditioning apparatus is capable of performing a heating-defrosting operation where a specific one of a plurality of parallel heat exchangers is a heat exchanger to be defrosted and serves as a condenser while at least one parallel heat exchanger other than the heat exchanger to be defrosted serves as an evaporator. The air-conditioning apparatus includes a liquid refrigerant transporting unit for transferring liquid refrigerant from an accumulator to the heat exchanger to be defrosted. To perform the heating-defrosting operation, the air-conditioning apparatus supplies, to the heat exchanger to be defrosted, the liquid refrigerant transferred by the liquid refrigerant transporting unit.

A liquid processing method can remove pure water existing within a pattern of a substrate and replace the pure water with a solvent rapidly. The liquid processing method of supplying the pure water onto the substrate, which is horizontally held and has the pattern formed on a surface thereof, and drying the substrate includes a pure water supplying process of supplying the pure water onto the surface of the substrate; a heated solvent supplying process of supplying, after the pure water supplying process, the solvent in a liquid state, which is heated to a temperature equal to or higher than a boiling point of water, onto the surface of the substrate on which the pure water exists; and a removing process of drying the substrate by removing the solvent form the surface of the substrate.

Liquid processing method, substrate processing apparatus and recording medium

There is provided a semiconductor device manufacturing method which includes: loading a substrate with a magnetic substance film formed thereon into a process container; regulating an internal pressure of the process container to a first pressure lower than an atmospheric pressure; regulating the internal pressure of the process container from the first pressure to a second pressure higher than the first pressure; and magnetizing the magnetic substance film by applying a magnetic field to the magnetic substance film under the second pressure.

Manufacturing method of semiconductor device having magnetic substance film

An air-conditioning apparatus is capable of efficiently performing defrosting operation without suspending a heating operation of an indoor unit. The air-conditioning apparatus includes a main circuit sequentially connecting, via a pipe, a compressor, indoor heat exchangers, first flow control devices, and a plurality of parallel heat exchangers connected in parallel to each other to allow refrigerant to circulate, first defrost pipes branching a part of the refrigerant discharged from the compressor and causing the part of the refrigerant to flow into one of the plurality of parallel heat exchangers to be defrosted, an interface heat exchanger located between the plurality of parallel heat exchangers, a first bypass pipe branching a part of the refrigerant discharged from the compressor and causing the part of the refrigerant to flow into the interface heat exchanger, and a second bypass pipe causing the part of the refrigerant flowing out of the interface heat exchanger to flow into the main circuit.

Air-conditioning apparatus for a plurality of parallel outdoor units

Growing community of inventors

Tokyo, Japan

Koji Yamashita