Sharp Kabushiki Kaisha Corporation

Koji Tanimura

Akira Inoue

Tohru Okabe

Shinsuke Saida

Ryosuke Gunji

Shinji Ichikawa

Yoshihiro Nakada

Hiroharu Jinmura

Hiroki Taniyama

Yoshihiro Kohara

Kohji Ariga

Shoji Okazaki

Tokuo Yoshida

Takeshi Yaneda

A display device includes: a sealing film provided so as to cover light-emitting elements at least partially constituting a display area and including a first inorganic film, an organic film, and a second inorganic film stacked in this order; and a first damming wall in a frame area around the display area, the first damming wall surrounding the display area and overlapping a peripheral portion of the organic film, wherein at least one inorganic insulation film in a TFT layer has an upwardly open, first opening at least in a part of an area between the display area and the first damming wall, and the organic film is provided so as to fill in the first opening.

Display device and method of manufacturing same

A TFT layer and an organic EL element layer are provided in this order on a resin substrate layer, the TFT layer includes source wiring lines, high-level power source wiring lines, conductive portions including connection wiring lines between TFTs, and a flattening film covering the conductive portions provided on the interlayer insulating film, a frame region is provided with a bending portion including a portion where a slit is formed in an inorganic insulating film including the interlayer insulating film, and a flattening auxiliary film is provided between each adjacent ones of the conductive portions, formed of a material identical to a material of the frame flattening film that fills the slit of the bending portion, in a layer identical to a layer of the frame flattering film, and covered with the flattening film together with the conductive portions.

Display device including bending portion with frame flattening film and slits

Frame wiring lines are provided in a frame region, a flattening film in which a frame-shaped slit is formed in the frame region is provided in the display region and the frame region, a plurality of first electrodes constituting light-emitting elements are provided on the flattening film, and conductive layer made of the same material and formed in the same layer as those of each of the plurality of first electrodes are provided covering at least end faces of the frame wiring lines exposed from the slit.

Display device

An organic EL display () has a bend (B) where a slit () is bored in a base coat film (), gate insulating film (), first interlayer insulating film () and second interlayer insulating film (). The bend is provided with a filler layer () filling the slit and covering both edges of the slit. The filler layer has a protrusion () overlapping each edge in the width direction of the slit. A routed wire () routed from the display region (D) and then routed over the filler layer to reach a terminal section (T) extends over the protrusion.

Display device and method for manufacturing same

A display device includes: a plurality of control lines; a plurality of power supply lines; a plurality of data signal lines; an oxide semiconductor layer; a first metal layer; a gate insulation film; a first inorganic insulation film; a second metal layer; a second inorganic insulation film; and a third metal layer. The oxide semiconductor layer, in a plan view, contains therein semiconductor lines formed as isolated regions between a plurality of drivers and a display area. The semiconductor lines cross the plurality of control lines and the plurality of power supply lines, are in contact with the plurality of control lines via an opening in a gate insulation film, are in contact with the plurality of power supply lines via an opening in the first inorganic insulation film, and have a plurality of narrowed portions, such that thicker and thinner regions exist along the same line.

Display device with reduced occurrences of electrostatic discharge

A first conductive layer in the same layer as that of a first electrode is coupled to a third conductive layer and a second electrode in the same layer as that of a third metal layer through a slit formed in a flattening film of a non-display area. Second conductive layers in the same layer as that of a second metal layer are provided to overlap with the slit.

An active matrix substrate including a resin substrate including a plurality of external connection terminals arranged near a display region, the active matrix substrate includes: a plurality of first lead wires each extending from one of the external connection terminals to the display region; and a plurality of second lead wires each extending from one of the external connection terminals to a separation line, the second lead wires being arranged with an arrangement pitch along the separation line, and the arrangement pitch of the second lead wires being greater than an arrangement pitch of the first lead wires.

Active matrix substrate, display device, and motherboard

A display device includes: a resin substrate; a TFT layer; and a light-emitting element. A bending portion is provided with a first resin film formed of the same material and in the same layer as those of a first flattening film, and the first resin film fills a slit. An upper face of the first resin film is provided with a plurality of first connection wiring lines formed of a third metal film, and the plurality of first connection wiring lines extend in parallel to each other in a direction intersecting the extending direction of the bending portion. The plurality of first connection wiring lines are electrically connected to a plurality of first lead-out wiring lines, respectively in a display region side of the slit, and electrically connected to a plurality of second lead-out wiring lines, respectively in a terminal portion side of the slit.

In a TFT layer provided on a base substrate, a first metal film, a first inorganic insulating film, a second metal film, a second inorganic insulating film, a third metal film, a first flattening film, a fourth metal film, and a second flattening film are sequentially layered. In a frame region, a slit is formed in the second flattening film to surround a display region, a first conductive layer formed by the fourth metal film is provided on the first flattening film exposed from the slit, and a TFT of a drive circuit is provided on the base substrate side of the first conductive layer to overlap with the first conductive layer.

Display device having a slit passing through the second flattening film

In a display region, each first power-source line and each second power-source line intersecting with the first power-source line are electrically connected together via a contact hole in a second inorganic insulating film. In addition, each source line and each second power-source line intersect with each other via the second inorganic insulating film and a first organic insulating film.

In a display device, an inorganic insulating layer, a metal layer, a flattering film, a first electrode, an edge cover, a function layer, and a second electrode are formed, in that order, on a base substrate. The edge cover covers an edge of the first electrode and includes a first opening exposing the first electrode. The function layer is formed covering the first opening and an edge of the edge cover. The flattening film includes a first planar portion and a second planar portion having a film thickness smaller than that of the first planar portion, is configured to electrically connect the first electrode and the metal layer via a contact hole formed in the first planar portion, and overlaps the first opening of the edge cover at at least a portion of the second planar portion.

Display device and method for producing display device

In a display device, a second wiring line extends in a display region and includes an imaginary straight line that extends from the second wiring line in an extension direction of the second wiring line and intersects with an opening of an edge cover. The second wiring line extends along the peripheral edge of the opening without intersecting with the opening of the edge cover.

Display device comprising TFT layer and light-emitting element layer

In a display region, etching stopper layers are provided between a plurality of inorganic insulating films, openings are formed in the inorganic insulating films located closer to a light-emitting element than the etching stopper layers so as to expose the upper surfaces of the etching stopper layers, and flattening films are provided in the openings such that the openings are filed with the flattening films.

Display device and method for manufacturing display device

In a step of forming a plurality of control lines composed of a first metal layer a first metal layer branch line is formed. In a step of forming a plurality of power source lines composed of a second metal layer a second metal layer connecting portion is formed that connects each power source line with the first metal layer branch line via an opening of a first insulating film. In a step of forming a plurality of data signal lines composed of a third metal layer that is formed on a second insulating film the first metal layer branch line formed in the opening of the first insulating and the second metal layer connecting portion formed in an opening of the second insulating film are etched.

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Yonago, Japan

Koji Tanimura