Ebara Corporation

Nec Corporation

Ntt Docomo, Inc.

Janome Sewing Machine Company Limited

Kao Corporation

Hitachi Metals, Ltd.

Janome Corporation

Teijin Limited

Ckd Corporation

Anelva Corporation

Denso Corpora Tion

Koji Maeda

Hiroshi Shimomoto

Mitsuhiko Inaba

Soichi Isobe

Haiyang Xu

Takahiro Asai

Hitoshi Yoshino

Kuniaki Yamaguchi

Hidetatsu Isokawa

Anass Benjebbour

Kenji Shinkai

Tetsuya Yashima

Hiroki Harada

Mitsuru Miyazaki

Hideaki Tanaka

Junji Kunisawa

Tomoyuki Ohya

Hiroshi Aono

Toru Otsu

Fujihiko Toyomasu

Yuji Aburakawa

Izumi Fukasaku

Hisajiro Nakano

Koichi Hashimoto

Shinji Kawamura

Masayoshi Imai

Satoru Fukumoto

Yosuke Iizuka

Takuya Sawada

Koichi Honda

Shun Ehara

Saki Ishikawa

Akira Suzuki

Takashi Matsumoto

Takeshi Nakamura

Masaru Kokubo

Toru Maruyama

Hiroaki Kaneko

Motoyoshi Komoda

Katsushi Sasaki

Yoshinori Murakami

Yoshikazu Ebata

Wataru Funakoshi

Yoichi Shiokawa

Ryuichi Kosuge

Yasuteru Eguchi

Hiroshi Takizawa

Shigeto Kayane

Ushio Yokoyama

Masayuki Tamura

Yutaka Tomiyori

Hidetaka Nakao

Makoto Ishida

Yusuke Wachi

Teruaki Hombo

Yuichi Kageyama

Tomoyuki Ooya

Hidetake Fujinaka

Yoshiki Aruga

Satoshi Tsujita

Satoshi Maruo

Tatsuo Takei

Yoshitaka Bamba

Toyohiro Azuma

Hidenori Yoshida

Mizuki Okada

Eiichi Syomura

Yoshitaka Yanou

Koji Ishihata

Shinobu Okuno

Xu Haiyang

Tustomu Takagi

Toru Niwa

Dai Yoshinari

Kentaro Asano

A sewing control device includes in a sewing machine having upper feed function a control device which controls feed of an object to be sewn. A lower feed amount setting motor sets a feed amount of a lower feed dog and an upper feed amount change motor changes a feed amount of an upper feed dog. A feed execution range, in which the feed of the object to be sewn is executed by an appropriate feed amount while the object to be sewn is sandwiched between the lower feed dog and the upper feed dog, and a feed non-execution range, in which the feed of the object to be sewn is not executed in a state in which the feed dogs do not act on the object to be sewn, are present. The feed amount of the upper feed dog can be changed only in the feed non-execution range during sewing.

Sewing control device and sewing machine

To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.

Substrate processing apparatus and method for removing substrate from table of substrate processing apparatus

A substrate processing apparatus includes a first processing unit and a second processing unit placed in upper and lower two stages. Each processing unit has: a plurality of processing tanks arranged in series; a partition wall defining a conveyance space extending along an arrangement direction outside the plurality of processing tanks; a conveyance mechanism placed in the conveyance space and being configured to convey a substrate between the processing tanks along the arrangement direction; and an air guide duct provided to extend along the arrangement direction in the conveyance space. The air guide duct is connected with a fan filter unit. Each of the processing tanks is connected with an exhaust duct. An opening is formed in each of parts facing the processing tank in the air guide duct. The conveyance spaces of the first and second processing units are separated into upper and lower segments by the partition wall.

Substrate processing device

[Purpose] To obtain a sewing machine comprising a device with which it is possible to easily perform a threading operation in which a needle thread is inserted into the needle hole of the sewing machine needle, wherein the sewing machine comprises a threading device configured so that the needle thread does not drop onto or coil around an operation part (operation part) of the operation lever of the threading device when a thread-hooking operation is completed before insertion of the needle thread. [Configuration] The present invention comprises: a needle bar; a threading shaft; a thread-holding tool; a threading toolprovided at the bottom end of the threading shaft; an operation leverthat has an operation partand moves the threading shaftup and down and rotates the threading shaft in the circumferential direction; and a cutting toolfor the needle thread n. The present invention is configured such that a needle thread guide member A, in which an inclined partis formed that guides the needle thread n from the thread-holding toolto the cutting tool, is provided between the thread-holding tooland the cutting tool, and the inclined part of the needle thread guide member A guides the needle thread n that has been cut by the cutting tool out of the operation range of the operation lever

Sewing machine with threading device

A substrate processing apparatus includes a polishing section and a transport section. The polishing section has a first polishing unit, a second polishing unit, and a transport mechanism. The first polishing unit has a first polishing apparatus and a second polishing apparatus. The second polishing unit has a third polishing apparatus and a fourth polishing apparatus. Each of the first to fourth polishing apparatuses has a polishing table to which a polishing pad is mounted, a top ring, and auxiliary units that perform a process on the polishing pad during polishing. Around the polishing table, a pair of auxiliary unit mounting units for mounting the respective auxiliary units in a left-right switchable manner with respect to a straight line connecting a swing center of the top ring and a center of rotation of the polishing table is provided at respective positions symmetrical with respect to the straight line.

Substrate processing apparatus

Various methods of cleaning a substrate are provided. In one aspect, method of cleaning a substrate, comprising: holding and rotating a substrate by a substrate holder; and supplying a chemical liquid to a chemical liquid nozzle and supplying two fluids to a two-fluid nozzle while moving the chemical-liquid nozzle and the two-fluid nozzle radially outwardly from the center to the periphery of the substrate, wherein the distance of the chemical-liquid nozzle from a rotating axis of the substrate holder is longer than the distance of the two-fluid nozzle from the rotating axis of the substrate holder while the chemical-liquid nozzle and the two-fluid nozzle are moved radially outwardly from the rotating axis of the substrate holder.

Method of cleaning a substrate

A mechanism that conveys a substrate is cleaned in a cleaning unit. A substrate processing apparatus that includes a substrate polishing device and a substrate cleaning unit is disclosed. The substrate cleaning unit includes a cleaning module and a cleaning unit conveyance mechanism. The cleaning unit conveyance mechanism includes a hand and a hand open/close mechanism. The substrate processing apparatus further includes a hand cleaning unit. The hand cleaning unit includes a hand cleaning tank and a cleaning liquid injection mechanism.

A wireless receiver and a wireless reception method provide: to determine a gain based on a first resistor having a first temperature characteristic and a second resistor having a second temperature characteristic different from the first resistance; to output an output of the first resistor and an output of the second resistor, or a ratio between the output of the first resistor and the output of the second resistor; and to switches the gain of the first circuit based on the outputs or the ratio between the outputs.

Wireless receiver and wireless reception method

A substrate transport system includes a hand, a main positioning member permanently mounted on a base, where the main positioning member is engageable with the hand at a position offset by a first distance in the first axis direction and offset by a second distance in the second axis direction from a substrate transfer position, and a control unit that stores a position coordinate in the first axis direction and a position coordinate in the second axis direction of the hand in a state where the hand is positioned by being engaged with the main positioning member.

Substrate transport system, substrate processing apparatus, hand position adjustment method

In order to prevent a replacement of the needle plate in the situation not suitable for replacing the needle plate, a needle plate detachable mechanism has a needle plate fixing unit capable of being switched between a fixed state where a needle plate is fixed to a sewing machine body and an unfixed state where the fixed state is released; and a switching mechanism which is connected with the needle plate fixing unit for switching the needle plate fixing unit between the fixed state and the unfixed state, wherein the needle plate fixing unit is prevented from being switched when the needle is positioned below an upper surface of the needle plate or when the sewing machine motor is driven.

Needle plate detachable mechanism and sewing machine having needle plate detachable mechanism

In order to improve detachability of a needle plate, a needle plate detachable mechanism has a needle plate which is provided on a bed part of the sewing machine and made of a magnetic body; a magnet which is provided below the needle plate for fixing the needle plate by magnetic force; and a magnetic force changing mechanism which is connected with the magnet for changing the magnetic force acting on the needle plate by relatively moving the magnet with respect to the needle plate.

A substrate processing apparatus is provided with a polishing part that polishes a substrate, a transporting part that transports a substrate before polishing to the polishing part, and a cleaning part that cleans the polished substrate. The cleaning part has a first cleaning unit and a second cleaning unit that are vertically arranged in two stages. The first cleaning unit and the second cleaning unit each have a plurality of cleaning modules that are arranged in series. The transporting part has a slide stage that is disposed between the first cleaning unit and the second cleaning unit, and transports a substrate before polishing along an arrangement direction of the plurality of cleaning modules.

Provided is an electric transmission cable module that has both a squelch function and an AGC function, and realizes a highly accurate function while suppressing an increase in chip cost. Disclosed is an electric transmission cable module including a first amplifier that compensates for a cable loss of a conductive cable, a second amplifier having a variable gain function, a third amplifier allowed to transit between a normal state for amplifying a signal and an idle state having smaller power consumption than power consumption in the normal state, a detector that detects a signal level on a signal transmission line between the first amplifier and the third amplifier, an analog-to-digital conversion circuit that converts the signal level into a digital signal, a first control circuit that generates a gain adjustment signal for controlling a gain of the second amplifier based on the digital signal, and a second control circuit that controls transition between the normal state and the idle state of the third amplifier based on the digital signal.

Electric transmission cable module and transmission loss compensation circuit

The cleaning apparatus includes multiple kinds of cleaning modules each configured to perform a cleaning processing of a substrate, a first accommodating section configured to accommodate the multiple kinds of cleaning modules therein, and a fluid supply section configured to supply a fluid to the cleaning modules accommodated in the first accommodating section through a pipe. Each of the multiple kinds of cleaning modules includes a pipe connection portion having a common connection position to be connected with the pipe.

Cleaning apparatus and substrate processing apparatus

Growing community of inventors

Tokyo, Japan

Koji Maeda