Sumitomo Chemical Company, Limited

M&g Eco-Battery Co., Ltd.

Japan Capacitor Industrial Co., Ltd.

Koji Kuwana

Yasunori Uetani

Hirotoshi Nakanishi

Fumio Oi

Jun Tomioka

Makoto Hanabata

Yukio Hanamoto

Isao Matsumoto

Hua Zhou

Takeshi Hioki

Ryotaro Hanawa

Ayako Ida

Yasunori Doi

Hiroshi Takagaki

In a method for manufacturing a metal-made three-dimensional substrate, a metal foil is passed between a pair of rollersand. Each surface S of a pair of the rollersandis provided with protrusion portionsarranged in a grid pattern, and the protrusion portionsare arranged so that protrusionsof the one rollerare oriented toward the centerof a virtual quadrangle having four adjacent protrusion portionstoof the other rolleras the apices.

Method for manufacturing metal-made three-dimensional substrate for electrodes, metal-made three-dimensional substrate for electrodes and electrochemical applied products using the same

An electrode group E in which a positive electrodeand a negative electrodeare spirally-rolled interposing a separatoris contained in a bottomed cylindrical can. A metal exposure portionprovided on an end surface of the positive electrodeof the electrode group E or a metal-made current collecting plateelectrically connected to the metal exposure portion(called a current collecting portion of a positive electrode) and a cover bodyalso functioning as a positive electrode terminal are electrically connected by a metal lead plate. One or more electrolyte resistant metal pressersare arranged and electrically connected between the current collecting portion of the positive electrode and the cover body. The electrode group E is applied pressure by the cover bodyand the bottom portionof the bottomed cylindrical can

Secondary battery with a spirally-rolled electrode group

A positive resist composition comprising an alkali-soluble resin containing a novolak resin which is obtained by a condensation reaction of a phenol compound and a carbonyl compound and has an area in a GPC pattern of a range in that a molecular weight as converted to polystyrene is not larger than 900 not exceeding 20% of a whole pattern area excluding the unreacted phenol compound, a quinonediazide compound and a polyphenol compound of the formula: ##STR1## in which R.sub.1 and R.sub.2 are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a group: --OCOR.sub.3 in which R.sub.3 is an alkyl group or a phenyl group, x and y are independently an integer of 1 to 3, and m is an integer of 0 to 4, wherein a weight ratio of said polyphenol compound (I) to said alkali-soluble resin is from 3:10 to 5:10, which is excellent in heat resistance, sensitivity, resolution and a depth of focus and leaves no scum after development.

Positive resist composition comprising a quinone diazide sulfonic acid

A positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, first and second quinone diazide sulfonic acid esters of a phenol compound, wherein

Resist composition comprising a quinone diazide sulfonic diester and a

A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.2 is a hydrogen atom, an alkyl or aryl group is present at the ortho position to a hydroxyl group which is present at the ortho position to X provides a positive resist composition which has a high .gamma.-value.

Resist composition, novel phenol compound and quinone diazide sulfonic

A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.

Process for preparing radiation sensitive compound and positive resist

A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I) or (II): ##STR1## wherein a, c and d are the same or different and a number of 0 to 3, provided that when a is 0 or 3, b is a number of 0 to 3 or when a is 1 or 2, b is 0, 1 or 2, and a+b and c+d are not less than 2; R and R' are the same or different and an alkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.

Positive photoresist composition containing alkali-soluble resin and

A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

Process for preparing a positive resist composition by mixing the

A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1 and Y.sub.2 are each a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are the same or different and each a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are hydroxyl groups; R.sub.1, R.sub.2 and R.sub.3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.

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Fujiidera, Japan

Koji Kuwana