Kabushiki Kaisha Kobe Seiko Sho

Kobe Steel USA, Inc.

Kobe Steel USA Inc., Electronic Materials Center

Koji Kobashi

Koichi Miyata

Kozo Nishimura

Takeshi Tachibana

Kazuo Kumagai

Yoshihiro Yokota

Kazushi Hayashi

Shigeaki Miyauchi

Rie Kato

Kimitsugu Saito

Akimitsu Nakaue

Hisashi Koyama

Yuichi Matsui

Yoshihiro Shintani

Brian Rhys Stoner

David L Dreifus

Hiroyuki Tachibana

Jesko A Von Windheim

Takashi Kobori

Takayoshi Inoue

Toshihisa Nozawa

Kenichi Inoue

Nobuyuki Kawakami

Maki Hamaguchi

Katsumi Yoshino

Kohei Suzuki

Norio Suzuki

Yutaka Kawata

Bradley A Fox

Yoshio Kawate

Kiyotaka Ishibashi

Rie Nakamura

Kumar Das

Rie Katoh

Hisahi Koyama

A highly-oriented diamond film which has a flat surface but does not have non-oriented crystals in the surface can be provided by depositing a first diamond layer on a substrate by {111} sector growth of diamond crystals by a CVD method using a gaseous mixture of methane and hydrogen as material gas, and then depositing a second diamond layer on the first diamond layer by {100} sector growth of diamond crystals by a plasma CVD method using a gaseous mixture of methane, hydrogen, and oxygen as material gas under the conditions that the pressure of the material gas is 133 hPa or more; the material gas composition is determined such that ([C]&#x2212;[O])/[CH+H+O] is &#x2212;0.2&#xd7;10or more and [O]/[C] is 1.2 or less; and the substrate temperature is between 750&#xb0; C. and 1000&#xb0; C.

Highly-oriented diamond film, method for manufacturing the same, and electronic device having highly-oriented diamond film

A method for manufacturing a multilayered substrate for a semiconductor device, as well as a semiconductor device, is provided, the multilayered substrate exhibiting an excellent thermal conduction property and an excellent heat spreading effect without occurrence of warp and deformation. A diamond layer is formed through vapor phase deposition on one principal surface of a first silicon substrate by a CVD method. A SiOlayer is formed on this diamond layer. A SiOlayer is formed on a surface of a second silicon substrate by a thermal oxidation method. The diamond layer is bonded to the second silicon substrate with SiOlayers disposed on both the diamond layer and the second silicon substrate therebetween. The first silicon substrate is removed by dissolution through etching to expose the surface of the diamond layer. A silicon layer serving as a semiconductor layer is formed on the diamond layer by a CVD method.

Semiconductor device and method for manufacturing multilayered substrate for semiconductor device

A semiconductor device and package has a heat spreader directly disposed on the reverse surface of the semiconductor device. This heat spreader includes a diamond layer or a layer containing diamond and ceramics such as silicon carbide and aluminum nitride. The heat spreader is directly formed on a substrate for the semiconductor device. In particular, the heat spreader is composed of a diamond layer and one or two metal or ceramic members, which are bonded to the diamond layer with one or two polymer adhesive layers. This diamond layer has a fiber structure across the thickness or a microcrystalline structure. Cilia are formed on a surface of the diamond layer facing the one or two metal or ceramic members.

Heat spreader and semiconductor device and package using the same

A method of forming a diamond film includes synthesizing a diamond film on a surface of a substrate, where the surface of the substrate has trenches. The trenches inhibit delamination of the diamond film.

Method of forming diamond film

An organic LED is provided that can stably and efficiently emit light as a result of a heat resistant hole drift layer. The organic LED can include, in order, a substrate, a hole injection electrode layer, a hole drift layer, an organic light emitting layer, an electron drift layer and an electron injection electrode layer. The hole drift layer comprises a diamond film with a boron concentration of between about 1.0&times;10,and about 1.0&times;10,/cm,. An optically transparent layer can be formed on the electron injection electrode layer.

Organic light emitting device using diamond film

Diamond films and novel method to grow the diamond films can improve the performance of products utilizing diamond films. In the cathodoluminescence taken at room temperature, the integrated intensity ratio of the diamond films, CL.sub.1 /CL.sub.2, is equal or greater than 1/20, where CL.sub.1 is the integrated intensity of the emission band in the wavelength region shorter than 300 nm while CL.sub.2 is the integrated intensity of the emission band in the wavelength region from 300 nm to 800 nm. Such high quality diamond films with intensive coalescence on the surface can be obtained by deposition on the substrates or films, made of at least one member selected from the group consisting of platinum, platinum alloys, iridium, iridium alloys, nickel, nickel alloys, silicon, and metal silicides.

Diamond films and methods for manufacturing diamond films

A light emitting element and a flat panel display that includes the element has a diamond film, which can achieve a stable and strong light emission with low electricity consumption. The light emitting element has a multilayer structure with an optional base material, a lower electrode, a diamond film, a fluorescent thin film, an upper electrode, and an upper electrode for wiring purposes. Under a proper biasing voltage between the lower and upper electrodes, carriers (either electrons or holes) are injected from the lower electrode to the diamond film, and are accelerated in the diamond film, so as to excite the fluorescent thin film and cause the thin film to fluoresce.

Light emitting element and flat panel display including diamond film

A method for microfabricating diamond includes the steps of: forming a resist layer composed of a ladder silicone spin-on glass material on the surface of diamond; performing lithography, in which the resist layer is irradiated with an electron beam or an ion beam in a given pattern; developing the resist layer to form the given pattern; and etching diamond by an ECR plasma etching method or a high-frequency plasma etching method.

Method for microfabricating diamond

Disclosed is a method of forming electrodes on diamond comprising the steps of: forming a mask pattern on diamond or diamond film; performing a treatment of the diamond surface by a plasma of inert gases; forming an electrode film on the whole surface of the specimen; and removing the mask, thereby forming a specified pattern of the electrodes. By this method, it is possible to form electrodes having high adhesion to diamond and diamond film for electronic devices.

Method for forming electrode on diamond for electronic devices

Provided is a process for economically producing single crystal diamond film with a large surface area by gas-phase synthesis. The process comprises depositing platinum film or platinum alloy film containing more than 50 atomic % of platinum on a basal substrate with (111) or (001) surface while keeping the substrate temperature at 300.degree. C. or above, annealing the platinum or platinum alloy film at 1000.degree. C. or above, and performing the gas-phase synthesis of diamond using said platinum or platinum alloy film as the substrate.

Process for producing single crystal diamond film

A method is related to grow monocrystalline diamond films by chemical vapor deposition on large area at low cost. The substrate materials are either bulk single crystals of Pt or its alloys, or thin films of those materials deposited on suitable supporting materials. The surfaces of those substrates must be either (111) or (001), or must have domain structures consisting of (111) or (001) crystal surfaces. Those surfaces can be inclined within .+-.10 degree angles from (111) or (001). In order to increase the nucleation density of diamond, the substrate surface can be scratched by buff and/or ultrasonic polishing, or carbon implanted. Monocrystalline diamond films can be grown even though the substrate surfaces have been roughened. Plasma cleaning of substrate surfaces and annealing of Pt or its alloy films are effective in growing high quality monocrystalline diamond films.

Methods for manufacturing monocrystalline diamond films

The present invention is a diamond electrode with high efficiency, a small overvoltage, and a long lifetime, which is reusable, and which can measure the temperature of the electrode. The diamond electrode is at least partially composed of a semiconducting diamond film, whose surface is chemically modified. Another embodiment of the present invention carbon is used as a bare electrode material, diamond crystals are fixed to the bare electrode material, the surface of the undoped diamond crystals are covered with semiconducting diamond film, or semiconducting diamond crystals are fixed to said bare electrode material, and the surfaces of diamond films or crystals are chemically modified. Furthermore, wires may be connected to the diamond electrode to measure the electrical resistance, and hence the temperature.

Diamond electrode

A diamond film biosensor has a transducer that is partially or totally composed of semiconducting diamond film and/or undoped diamond film. A bioidentifier is fixed partly or entirely on the surface of said semiconducting diamond film and/or undoped diamond film. The peripheral circuits are partly or entirely composed of undoped diamond film and/or semiconducting diamond film. The diamond film biosensor can detect chemical substances and biosubstances with a high sensitivity and fast response, has a long lifetime, and is reusable.

Diamond film biosensor

Disclosed is planar and vertical cold cathode emitter elements including an semiconducting diamond emitter portion having a high thermal resistance and a high breakdown voltage, thereby suppressing the deterioration of the electron emission characteristics and enabling the operation with a high electric power.

Growing community of inventors

Kobe, Japan

Koji Kobashi