Dai Nippon Printing Co., Ltd.

Koji Ichimura

Takaharu Nagai

Katsutoshi Suzuki

Kouji Yoshida

Saburou Harada

Yuichi Inazuki

Ryugo Hikichi

Katsuya Sakayori

Shunji Fukuda

Keita Arihara

Tatsuji Nakajima

Naoko Nakata

Kei Amagai

Naoshi Kawamata

A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.

Production method of template, template blank, and template substrate for imprinting, production method of template for imprinting, and template

An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

Imprint method and imprint mold manufacturing method

An imprint mold has a base, an uneven structure area set on a surface of the base, a measurement area set in the uneven structure area, and a measurement mark structure positioned in the measurement area, the measurement mark structure having a plurality of pattern sets each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.

Imprint mold and imprint method

Disclosed is a substrate for a flexible device which, when a TFT is produced on a flexible substrate in which a metal layer and a polyimide layer are laminated, can suppress deterioration of the electrical performance of the TFT due to the surface irregularities of the metal foil surface and can suppress detachment or cracks of the TFT. Also disclosed is a substrate for a thin film element which has excellent surface smoothness and is capable of suppressing deterioration of the characteristics of thin film elements. Also disclosed are methods for manufacturing substrates for thin film elements.

Substrate for flexible device, thin film transistor substrate for flexible device, flexible device, substrate for thin film element, thin film element, thin film transistor, method for manufacturing substrate for thin film element, method for manufacturing thin film element, and method for manufacturing thin film transistor

In a reflection-type liquid crystal display panel () provided with reflective electrodes (), a reflective metal film () is formed on an insulating layer () having a surface provided with minute irregularities () to form the reflective metal electrodes having surfaces of a shape substantially complementary to the minute irregularities. Since the surfaces of the electrodes () are provided with minute irregularities, external light incident on the liquid crystal display panel is not reflected in a specular reflection mode, so that images are displayed on the liquid crystal display panel in satisfactory visibility. The insulating layer is formed by forming a positive photosensitive resin layer on a back substrate (), exposing the positive photosensitive resin layer to light through a transparent sheet () having a surface provided with minute irregularities, and subjecting the exposed positive photosensitive resin layer to a developing process. The thus fabricated liquid crystal display panel is capable of suppressing reflection of external matters therein and of displaying images in satisfactory visibility. The insulating layer () underlying the electrodes () is patterned in a pattern similar to that of the electrodes () to suppress current leakage between the electrodes. A method of fabricating the reflection-type liquid crystal display panel is also disclosed.

Reflection-type liquid crystal display panel and method of fabricating the same

A low refractive index SiOfilm is provided which uses a starting material for forming an SiOfilm and has a lower refractive index than the conventional SiOfilm. A starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom is subjected to plasma CVD in a vacuum chamberto form an SiOfilm on a webin a plasma zone. The SiOfilm thus formed has, at least one low refractive index element selected from a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and the SiOfilm with the low refractive index element introduced thereinto has a lower refractive index than an SiOfilm with the low refractive index element not introduced thereinto.

[object Object]

A silica layer is provided which is usable as a low refractive index layer undergoing no change in its refractive index. Further, a silica layer is provided which is highly productive and usable as a medium or high refractive index layer undergoing neither reduction in transmittance nor change in spectral colors. Still further, an antireflection film using these silica layers is provided.

Silica layers and antireflection film using same

In a reflection-type liquid crystal display panel (,) provided with reflective electrodes (,), a reflective metal film (,) is formed on an insulating layer (,) having a surface provided with minute irregularities (,) to form the reflective metal electrodes having surfaces of a shape substantially complementary to the minute irregularities. Since the surfaces of the electrodes (,) are provided with minute irregularities, external light incident on the liquid crystal display panel is not reflected in a specular reflection mode, so that images are displayed on the liquid crystal display panel in satisfactory visibility. The insulating layer is formed by forming a positive photosensitive resin layer on a back substrate (,), exposing the positive photosensitive resin layer to light through a transparent sheet (,) having a surface provided with minute irregularities, and subjecting the exposed positive photosensitive resin layer to a developing process. The thus fabricated liquid crystal display panel is capable of suppressing reflection of external matters therein and of displaying images in satisfactory visibility. The insulating layer (,) underlying the electrodes (,) is patterned in a pattern similar to that of the electrodes (,) to suppress current leakage between the electrodes. A method of fabricating the reflection-type liquid crystal display panel is also disclosed.

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Tokyo-to, Japan

Koji Ichimura