Sumitomo Chemical Company, Limited

Sumitomo Chemical Companylimited

Koji Ichikawa

Tatsuro Masuyama

Satoshi Yamaguchi

Yukako Anryu

Hiromu Sakamoto

Yuichi Mukai

Masahiko Shimada

Katsuhiro Komuro

Shingo Fujita

Satoshi Yamamoto

Isao Yoshida

Takahiro Yasue

Masako Sugihara

Mitsuyoshi Ochiai

Yuki Suzuki

Takashi Hiraoka

Takashi Nishimura

Akira Kamabuchi

Yuki Takahashi

Takayuki Miyagawa

Mutsuko Higo

Haruyoshi Osaki

Yuko Yamashita

Masafumi Yoshida

Yusuke Fuji

Mitsuhiro Hata

Kaoru Araki

Hyungjoo Kim

Shota Nakano

Yuji Kita

Takuya Nakagawa

Natsuki Okada

Hiromu Nakamura

Yasunori Uetani

Kazuhiko Hashimoto

Fumiyoshi Urano

Naoki Takeyama

Jun Tomioka

Yoshiyuki Takata

Hirotoshi Fujie

Hiroki Inoue

Jun Oguma

Nobuhito Fukui

Koshiro Ochiai

Soon Shin Kim

Nobuhiko Nishitani

Singo Fujita

Takashi Nakakoji

Saki Kato

Yuko Mukai

A resist composition includes (A1) a resin including a structural unit represented by formula (I) and a structural unit represented by formula (II), and no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rand Reach represent a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, Xand Xeach represent a single bond or *—CO—O—, Lrepresents a single bond or a hydrocarbon group which may have a substituent, and —CH— included in the group may be replaced by —O—, —S—, —SO— or —CO—, ring W represents a hydrocarbon ring which may have a substituent, mi and mk represent an integer of 1 to 4, and Lrepresents a single bond or a hydrocarbon group which may have a substituent, and —CH— included in the group may be replaced by —O—, —S—, —SO— or —CO—.

Resist composition and method for producing resist pattern

A salt capable of producing a resist pattern with satisfactory CD uniformity (CDU) represented by formula (I), an acid generator and a resist composition including the same: wherein R, R, Rand Reach represent a halogen atom, a haloalkyl group, etc., Aand Aeach represent a hydrocarbon group, the group may have a substituent, —CH— in the group may be replaced by —O—, —CO—, —S—, —SO—, etc., Xand Xeach represent —O— or —S—, m1 present an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4 and m5 represent an integer of 0 to 3, m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, and AIrepresents an organic anion.

Salt, acid generator, resist composition and method for producing resist pattern

Disclosed are a resin comprising a structural unit represented by formula (I), and a structural unit represented by formula (a1-1) and/or a structural unit represented by formula (a1-2), and a resist composition including this resin:

Resin, resist composition and method for producing resist pattern, and compound

Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; Xand Xeach represent *—CO—O—, *—O—CO—, etc.; Lrepresents a single bond or a hydrocarbon group which may have a substituent; Arepresents a group having a lactone structure which may have a substituent; Land Leach represent a single bond or an alkanediyl group; Rrepresents an iodine atom or a haloalkyl group; Rrepresents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Zrepresents an organic cation.

Disclosed is a salt represented by formula (I): wherein, in formula (I),

Provided are a carboxylate capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. Disclosed are a carboxylate represented by formula (I) and a resist composition: wherein Ar represents an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, Xrepresents an oxygen atom or a sulfur atom, Rrepresents a halogen atom or a haloalkyl group having 1 to 12 carbon atoms, Rrepresents a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH— included in the haloalkyl group and the alkyl group may be replaced by —O— or —CO—, m1 represents an integer of 1 to 6, m2 represents an integer of 0 to 4, and Zrepresents an organic cation.

Carboxylate, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I) and a resist composition including the same:

Salt, quencher, resist composition and method for producing resist pattern

A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R, Rand Reach represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO—, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and Xrepresents a single bond, —CH—, —O—, —S—, —CO—, —SO— or —SO—.

Carboxylate, quencher, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; Xrepresents *—CO—O—, *—O—CO—, etc.; Lrepresents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; Xrepresents an oxygen atom or a sulfur atom; Rrepresents a halogen atom or a haloalkyl group; Rrepresents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Zrepresents an organic cation.

A salt represented by formula (I) and a resist composition including the salt are described.

A salt represented by formula (I), an acid generator and a resist composition: wherein R, Rand Reach represent a hydroxy group, —O—R, —O—CO—O—R, —O-L-CO—O—R; R, R, R, R, Rand Reach represent a halogen atom, a hydroxy group, etc.; Lrepresents an alkanediyl group; Rrepresents an acid-labile group; X, Xand Xeach represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; Xrepresents a single bond, —CH—, —O—, —S—, etc.; and AIrepresents an organic anion.

A salt represented by formula (I), a generator and a resist composition: wherein Rand Reach independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R, R, Rand Reach independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, &#x2014;CH&#x2014; included in the haloalkyl group and the alkyl group may be replaced by &#x2014;O&#x2014;, &#x2014;CO&#x2014;, &#x2014;S&#x2014; or &#x2014;SO&#x2014;; Xand Xeach independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1&#x2264;m1+m7&#x2264;5, 0&#x2264;m2+m8&#x2264;5; and AIrepresents an organic anion.

Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein Rrepresents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, Rand Reach independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, Rrepresents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the alkyl fluoride group and the alkyl group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Rrepresents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2&#x2264;m2+m4+m5&#x2264;5.

Compound, resin, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

A salt represented by formula (I), an acid generator and a resist composition: wherein R, Rand Reach represent a hydroxy group, &#x2014;O&#x2014;R, &#x2014;O&#x2014;CO&#x2014;O&#x2014;Ror &#x2014;O-L-CO&#x2014;O&#x2014;R, Lrepresents an alkanediyl group, R, R, R, R, Rand Reach represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, Rrepresents an acid-labile group, X, Xand Xeach independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1&#x2264;m1+m7&#x2264;5, 0&#x2264;m2+m8&#x2264;5, 0&#x2264;m3+m9&#x2264;5, and AIrepresents an organic anion.

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Osaka, Japan

Koji Ichikawa