Tokyo University of Science Foundation

Ricoh Company, Ltd.

Sony Corporation

Tokyo Ohka Kogyo Co., Ltd.

Nissan Chemical Industries Limited

Nippon Kayaku Kabushiki Kaisha

Fujifilm Wako Pure Chemical Corporation

Sekisui Chemical Co., Ltd.

Toagosei Company, Ltd.

Koji Arimitsu

Soh Noguchi

Nobuyuki Matsuzawa

Dai Shiota

Kunihiro Noda

Okitoshi Kimura

Nobuhiko Sakai

Kiwamu Terada

Kosuke Yanaba

Isao Mita

Makoto Wakabayashi

Takashi Okada

Mitsunobu Morita

Hiroji Fukui

Tatsuki Yamaguchi

Shigeaki Imazeki

Kazuyoshi Yamamoto

Shunsuke Kondo

Kento Oomura

A photobase generator includes a compound including: first skeletons represented by the following formula (a); and a second skeleton including nitrogen atoms bonding to bonding positions of the first skeletons to form amide groups, wherein, in a molecule, a number of the first skeletons is two or more, a number of the nitrogen atoms, configuring the amide groups, in the second skeleton is the same as the number of the first skeletons, and at least one of the nitrogen atoms configuring the amide groups is converted into a nitrogen atom configuring a secondary amine or a tertiary amine by light irradiation. In the formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

Photobase generator, compound, photoreactive composition, and reaction product

A photobase generator, includes a compound including a first skeleton represented by the following formula (a); and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, and a pyridine skeleton in addition to the nitrogen atom, in which the compound generates a base in which a hydrogen atom is bonded with the nitrogen atom of the second skeleton by light irradiation. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

Photobase generator, compound, photoreactive composition and reaction product

One embodiment of the present invention provides a curable composition, including a polyfunctional isocyanate compound, a compound selected from the group consisting of a multivalent alcohol and an epoxy compound, and a base amplifier.

Curable composition, cured product, and method of producing cured product

An energy-sensitive composition including a polysilane, a base generator, and a solvent, the base generator including a compound represented by formula (b1) and a photo base generator: in which Rto Reach independently represents a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonato group, phosphino group, phosphinyl group, phosphonato group or organic group; Rand Reach independently represent a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfino group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group or aliphatic group; and Rrepresents a hydrogen atom, alkyl group or alkoxy group.

Energy-sensitive composition, cured product, and forming method of patterned cured product

To provide an active-energy-ray-curable composition including a compound represented by General Formula (I) below: where in the General Formula (I), R is hydrogen or a methyl group; A is a structure expressed by one selected from the group consisting of Structural Formulas (II) to (VII) below, each of which may have a substituent such as an alkyl group or an alkoxy group, or both; j and k in the Structural Formulas (VI) and (VII) are an integer of 0 or more; X denotes a substituent including a heteroatom; n is an integer of 0 or more, m is an integer of 1 or more, and n+m is 3 or more, or n is an integer of 0 and m is an integer of 2; and wavy lines in the Structural Formulas (II) to (VII) each independently denote a bond with X or a (meth)acryloyl group (HC═CR—C(═O)—):

Active-energy-ray-curable composition, active-energy-ray-curable ink composition, active-energy-ray-curable inkjet ink composition, composition stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured material, and decorated article

A photobase generator includes a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and the pKa of a conjugate acid of the base in water is 12 or more. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

A photoreactive composition including a base-reactive compound, a photobase generator that is represented by the following Formula (1) and that generates a base when irradiated with light, and at least one compound selected from the group consisting of a polycyclic aromatic compound having a fused ring structure having two or more rings and a polycyclic aromatic compound having three or more aromatic rings and having a conjugated structure including any two or more of the three or more aromatic rings, in which the base-reactive compound is a compound having two or more groups that will have their polarity converted by the action of a base and that exhibit reactivity, in one molecule, or a compound having two or more groups that will react under the action of a base, in one molecule.

Photoreactive composition, reaction product, and method of producing reaction product

A method for manufacturing an electroconductive pattern, provided with: a lamination step for laminating an acid generation filmcontaining an acid proliferation agent and a photoacid generator on a polymer filmcontaining an electroconductive polymer formed on a substrate; a masking step for masking the top of the acid generation film; a light irradiation step for irradiating the laminate from the acid-generation-filmside; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation filmby the light irradiation; and a releasing step for releasing the acid generation filmfrom the polymer film. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.

Electroconductive film and method for manufacturing electroconductive pattern

An active energy ray-curable composition is disclosed including: wherein EWG represents an electron-withdrawing group, X represents a single bond or an oxygen atom (&#x2014;O&#x2014;), R represents an n-valent organic group, and n represents an integer of 1 to 6; when n is an integer of 2 to 6, the respective EWG and the respective X may be the same or different; and when n is 1, EWG and R may be bonded; and wherein ring A represents an aromatic ring that may be substituted or a heteroaromatic ring that may be substituted; Rand Rare the same or different and each represents a hydrogen atom or an alkyl group; Rand Rmay be bonded to each other to form a ring together with an adjacent nitrogen atom; and the ring may be substituted.

Active energy ray-curable composition

An energy-sensitive composition including at least one of a silane compound monomer capable of forming a polysilane compound, a silane compound oligomer and the polysilane compound, and a base generator (B) represented by the following formula (1): 

Energy-sensitive composition, cured product, and pattern forming method

An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound. The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound. Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group. Step 2: this is a step in which in the presence of the compound (A) and (E) compound having a carbonyl group generating a radical by photoirradiation and a group generating a base by being decarboxylated by photoirradiation, the compound (A) and the compound (E) are irradiated with light to create alkaline conditions in a reaction system by decarboxylating the carboxyl group of the compound (A) and generating a base from the compound (E), and radicals are generated from the compound (A) and the compound (E) to generate a crosslinked product containing a constitutional unit derived from the silane compound (D) from the silane compound (D) and, if necessary, from (F) compound having two or more polymerizable unsaturated groups.

Photocuring method, compound and composition used therein

The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): 

Compound, photopolymerization initiator comprising said compound, and photosensitive resin composition containing said photopolymerization initiator

The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. 

Base generator, base-reactive composition containing said base generator, and base generation method

Provided is a photosensitive resin composition that contains (A) a photobase generator and (B) an alkali-soluble epoxy compound, wherein the photobase generator (A) contains a compound represented by formula (2-1): and the alkali-soluble epoxy compound (B) is an epoxy compound obtained by reacting (c) a polybasic acid anhydride with a product of a reaction between (a) an epoxy compound having two or more epoxy groups in the molecule and (b) a compound having one or more hydroxyl groups and one carboxyl group in the molecule.

Growing community of inventors

Tokyo, Japan

Koji Arimitsu