Nippon Shokubai Kagaku Kogyo Co., Ltd.

Sony Corporation

Hitachi High-Tech Corporation

Hitachi-High-Technologies Corporation

Smartnews, Inc.

Hitachi High-Technologies Corpoartion

Koichi Yamamoto

Naoki Yasui

Yutaka Morimoto

Dai Yoneya

Kazutomo Takahashi

Takayoshi Omori

Masahito Mori

Kazuya Yamada

Norihiko Ikeda

Takao Arase

Seiichi Suzuki

Akira Hirata

Isao Mori

Kazuo Kodama

Hideyuki Nishibayashi

Jihee Kim

Akihiro Suzuki

Takashi Tazaki

Atsushi Itou

Hideaki Tsuneki

Yuuji Shimasaki

Ken Suzuki

Michio Ueshima

Motohiro Tanaka

Yasushi Sonoda

Tsutomu Iida

Masao Kitano

Yasumasa Tanaka

Tsunemasa Ueno

Hiromitsu Terauchi

Koji Toyota

Minoru Miyake

Teruo Kamei

Display panel of a programmed computer system with a graphical user interface

A plasma processing apparatus includes a processing chamber, a radio frequency power source, and a magnetic-field generation unit. In the processing chamber, a sample is subjected to plasma processing. The radio frequency power source supplies radio frequency power for a microwave. The magnetic-field generation unit forms a magnetic field for generating plasma by an interaction with the microwave. The magnetic-field generation unit includes a first power source and a second power source. The first power source causes a current to flow in a first magnetic-field forming coil configured to forma magnetic field in the processing chamber. The second power source causes a current to flow in a second magnetic-field forming coil configured to form a magnetic field in the processing chamber. Sensitivity for magnetic-field changing by the first magnetic-field forming coil is higher than sensitivity for magnetic-field changing by the second magnetic-field forming coil. A response time constant of the first power source is smaller than a response time constant of the second power source.

Plasma processing apparatus

An information processing apparatusincludes a message display modulewhich, when a predetermined event is predicted to occur at a set location of interest, displays a message indicating occurrence of the predetermined event and the time until the occurrence of the predetermined event. The location of interest may be set to a current position of the information processing apparatus. The information processing apparatusmay also include a map display modulethat displays a map including the location of interest, wherein the message displaying moduledisplays the message in such a manner as to be superimposed on the map.

Information processing apparatus and program

According to one embodiment, a plasma processing apparatus includes a processing chamber, a sample stage that is disposed inside the processing chamber and electrically divided into a plurality of regions on which a sample is placed, an electromagnetic wave introduction unit that introduces electromagnetic waves into the processing chamber, and a bias power applying unit that applies bias power to the sample stage, in which the bias power applying unit is configured to include a first radio frequency power applying unit that applies first radio frequency power to a first region out of the plurality of electrically divided regions of the sample stage, a second radio frequency power applying unit that applies second radio frequency power to a second region out of the plurality of electrically divided regions of the sample stage, and a phase adjuster that controls the first radio frequency power applying unit and the second radio frequency power applying unit to shift the phases of the first radio frequency power and the second radio frequency power by a predetermined amount.

Plasma processing apparatus and plasma processing method

A plasma processing apparatus includes: a high voltage power supply for supplying a high voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron, wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

Plasma processing apparatus and microwave output device

There is provided a method for controlling a plasma processing apparatus that eliminates a preliminary study on a resonance point while maintaining a low contamination and a high uniformity even in multi-step etching. In a method for controlling a plasma processing apparatus including the step of adjusting a radio frequency bias current carried to a counter antenna electrode, the method includes the steps of: setting a reactance of a variable element to an initial value; detecting a bias current carried to the counter antenna electrode; searching for a maximum value of the detected electric current; and adjusting a value of the reactance of the variable element from the maximum value to the set value and then fixing the value.

Method for controlling plasma processing apparatus

The plasma processing apparatus includes: a processing chamber disposed inside a vacuum vessel; a first high-frequency power supply outputting a first high-frequency power for supplying an electric field to generate a plasma for use in processing a sample to be processed inside the processing chamber; a sample stage disposed inside the processing chamber with the sample placed on an upper surface thereof; a second high-frequency power supply intermittently outputting a second high-frequency power for generating a bias potential to an electrode disposed inside the sample stage and capable of variably adjusting the output time; and a function to adjust operation of the plasma processing apparatus using a result of detection of a temporal change in waveform of current or voltage in a transient state of the second high-frequency power in synchronism with start of the intermittent output of the second high-frequency power.

A plasma processing apparatus is provided including a processing chamber disposed within a vacuum vessel to form plasma therein, a processing stage disposed in the processing chamber to mount a wafer thereon, a first power supply for outputting an electric field supplied to form the plasma and forming an electric field of a first frequency supplied with repetition of a high output and a low output during processing of the wafer, a second power supply for supplying power of a second frequency to an electrode disposed within the processing stage, and a control device for causing a first value between load impedance at time of the high output of the electric field and load impedance at time of the low output of the electric field to match with impedance of the first power supply.

Disclosed is a flat display allowed to facilitate a maintenance work for a back light unit contained in the flat display. The flat display includes a frame, display unit, back light unit, and chassis. The frame is positioned on the front side and has a window portion. The display unit, which is of a transmission type and is formed in a flat shape, is assembled from the rear side to the frame in such a manner as to be matched with the window portion to form an image screen. The chassis is positioned on the rear side and is engaged with the frame while putting the display unit therebetween to form a flat containing space on the back surface side of the display unit. The back light unit 3 is a surface light source which is pre-assembled using a flat case, and is removably insertable in the containing space. The back light unit functions to illuminate the transmission type display unit from the back surface side.

Back light assembly for flat panel display

As regards a surface light source device for use with back-light or the like of a transmissive display panel, the efficiency of the cooling structure for the device will be improved and dust and dirt will be prevented from adhering. The surface-light source device has a housing, a diffuser panel, a reflective plate, lamps, and an electric circuit portion. The housing has a window portion located ahead, a base portion located behind and side portions forming a flat space by connecting the two. The diffuser panel is mounted to the window portion of the housing. The reflective plate is supported by the side portions and partitions the flat space into a closed space ahead and an open space behind to be interposed therebetween. The lamps are housed in the closed space, and are positioned right above the reflective plate and right under the diffuser panel to radiate light toward the diffuser panel. The electric circuit portion is housed in the open space, and is electrically connected to the lamps to light them up. On the side portions of the housing, there are formed openings, through which cooling air supplied from outside is introduced into the open space to diffuse heat accumulated within the housing.

Surface light source device

As regards a surface light source device for use with back-light or the like of a transmissive display panel, the efficiency of the cooling structure for the device will be improved and dust and dirt will be prevented from adhering.The surface light source device has a housing, a diffuser panel, a reflective plate, lamps, and an electric circuit portion. The housing has a window portion located ahead, a base portion located behind and side portions forming a flat space by connecting the two. The diffuser panel is mounted to the window portion of the housing. The reflective plate is supported by the side portions and partitions the flat space into a closed space ahead and an open space behind to be interposed therebetween. The lamps are housed in the closed space, and are positioned right above the reflective plate and right under the diffuser panel to radiate light toward the diffuser panel. The electric circuit portion is housed in the open space, and is electrically connected to the lamps to light them up. On the side portions of the housing, there are formed openings, through which cooling air supplied from outside is introduced into the open space to diffuse heat accumulated within the housing.

Surface light source with air cooled housing

A plurality of successive evacuating carts for carrying respective cathode-ray tube bulbs thereon are circulatingly fed along a looped feed path into and out of an evacuating furnace. While in the evacuating furnace, the cathode-ray tube bulb carried on each of the evacuating carts is evacuated, and the evacuating pipe thereof is sealed. An evacuating pipe detecting device is disposed at a position along the feed path for detecting whether the evacuating pipe of the cathode-ray tube bulb carried on each of the evacuating units is damaged or not. If the evacuating pipe of any cathode-ray tube bulb is detected as being damaged and remains on the evacuating cart, the evacuating cart is discharged out of the feed path, and a replacement evacuating cart is charged into the feed path.

Apparatus for manufacturing cathode-ray tubes

Growing community of inventors

Tokyo, Japan

Koichi Yamamoto