Sony Corporation

Koichi Tago

Shinzo Takei

Shigeo Matsumoto

Hidetoshi Kato

Toshio Makita

Sumito Shina

An etching process is disclosed which is suited for manufacturing color selecting mechanisms in wide scope of specifications without need of complicated process of manufacture. The etching process comprises the steps of (a) forming an etching resist layer (20) on the front surface (10A) of a work (10) and also forming a protective layer (12) on the back surface (10B), (b) patterning the etching resist layer (12) to form a first opening (22) and a second opening (24) smaller than and near the first opening, and (c) etching the work to form a slit zone (32) under the first opening (22) and a recess (34) under the second opening (24) while removing at least a portion (10C) of the work spacing apart the slit zone (32) and the recess (34), thereby forming an electron beam passage slit (30) having a greater opening area defined on the side of the front surface (10A) by the slit zone (32) and the recess (34). (See FIG. 3 )

Etching process, color selecting mechanism and method of manufacturing

A method of manufacturing a color screen structure for a CRT. The color screen structure comprises a frame consisting of a pair of parallel supporting members and a pair of connecting members interconnecting the pair of supporting members at the opposite ends thereof, and a color screen member provided with a plurality of parallel slits in the color screening region thereof, a pair of slots formed outside the color screening region respectively alongside the opposite outermost slits, and a pair of grooves previously formed respectively along lines corresponding to the outer upper edges of the supporting members of the frame. The color screen member is welded to the supporting members of the frame so that the grooves extend respectively alongisde the outer upper edges of the supporting members, and then the unnecessary portions of the color screening member are torn off along the grooves.

Method of manufacturing color screen structure for a cathode ray tube

Method of manufacturing a cathode tube and for a ventilator used in its baking process which eliminates the need for a pre-baking process, and polyvinyl-alcohol (PVA) in the phosphor coating and an acrylic resin layer are completely baked and decomposed during the process of the frit-sealing furnace. A ventilator is used in its baking process. The panel portion and a funnel portion are placed in a frit-sealing furnace with a mutually coupled condition so that both portions are frit-sealed and the phosphor is baked. A bulb formed of the panel and funnel portions is provided with a ventilator means to carry out the baking operation.

Growing community of inventors

Kanagawa, Japan

Koichi Tago