Nec Corporation

Toppan Printing Co., Ltd.

Koichi Shinoda

Hirotaka Kobayashi

Tadashi Emori

Takayoshi Hayashi

Kazunari Mitsui

Toshiyuki Tsukahara

By providing a rib portionhaving a constant height in the range from 50% to 120% of the height of the highest point of a split lens structure between a plurality of split lenses, even when roll forming is performed at a high speed, trapping of air bubbles can be inhibited, and resin flow can be promoted; therefore, an optical elementhaving a surface on which a lens shape is formed and having a special optical effect can be obtained with few structural defects and high productivity.

Optical element, optical element stamper structure, printed article, and method for manufacturing optical element

A method and an apparatus for producing a relief-pattern forming, the method and apparatus being suitable for producing a film-like material, such as an embossed film, having a fine relief-structure pattern formed on a surface thereof so as to have a distinctive optical effect with higher quality, good productivity, and fewer defects. A transfer pattern printed layer having an inverted structure of a relief-structure pattern is formed on a second substrate by printing a transfer pattern onto the surface of a first substrate on which the relief-structure pattern is formed at a predetermined position by registration with the relief-structure pattern followed by drying, laminating with the second substrate, curing and peeling.

Method for producing relief-pattern formation, apparatus for producing the same, and seal

An image display that is to be transferred from a support onto a substrate and displays an image including personal information, according to a possible embodiment, includes: a base layer releasably supported by the support, having a light-transmitting property, a first pattern including a hologram and/or diffraction grating and transferred onto a main surface of the base layer, the first pattern displaying a first image including at least a piece of the personal information, the first pattern including dot-shaped portions, each center of the dot-shaped portions being located on a lattice point of a virtual planer lattice; and a second pattern displaying a second image, comprising an ink, and transferred onto the main surface of the base layer. At least a part of the first pattern and at least a part of the second pattern are juxtaposed on a same plane parallel to the main surface of the base layer.

Image display, labeled article, and methods of manufacturing thereof

A display includes a transparent base having one surface on which a structure-forming layer, a light reflection layer and a protective layer are sequentially laminated. The light reflection layer reflects part of the incident light, while transmitting therethrough the rest of the light. The structure-forming layer includes a plurality of structure areas, and each of the plurality of structure areas is formed of a concavo-convex structure.

Display

An image display is to be transferred from a support onto a substrate and displays an image including personal information. The image display includes a base layer releasably supported by the support and having a light-transmitting property, and an image display layer including a hologram and/or diffraction grating and transferred onto the base layer by a thermal transfer method using a thermal head. The image display layer displays an image including at least a piece of the personal information. An individual authentication medium including the image display, and manufacturing methods of the image display and individual authentication medium are also described.

A speech recognition apparatus using a probability model that employs a mixed distribution, the apparatus formed by a standard pattern storage means for storing a standard pattern; a recognition means for outputting recognition results corresponding to an input speech by using the standard pattern; a standard pattern generating means for inputting learning speech and generating the standard pattern; and a standard pattern adjustment means, provided between the standard pattern generating means and the standard pattern storage means, for adjusting the number of element distributions of the mixed distribution of the standard pattern.

Speech recognition apparatus

A voice recognition system comprises an analyzer for converting an input voice signal to an input pattern including cepstrum, a reference pattern for storing reference patterns, an elongation/contraction estimating unit for outputting an elongation/contraction parameter in frequency axis direction by using the input pattern and the reference patterns, and a recognizing unit for calculating the distances between the converted input pattern from the converter and the reference patterns and outputting the reference pattern corresponding to the shortest distance as result of recognition. The elongation/contraction unit estimates an elongation/contraction parameter by using cepstrum included in the input pattern. The elongation/contraction unit does not have various values in advance for determining the elongation/contraction parameter, nor is it necessary for the elongation/contraction unit have to execute distance calculation for various values.

Speaker's voice recognition system, method and recording medium using two dimensional frequency expansion coefficients

Pattern matching means,matches categories of a reference pattern stored in reference pattern memory means,and input samples of an input pattern produced by input pattern generating means,. Data statistics estimating means,calculates the numbers of input samples in individual nodes of a tree scheme reference pattern stored in the tree scheme reference pattern memory means,. Node selecting means,selects nodes used for adaptation according to the input sample numbers calculated by the data statistics estimating means,. Adaptation parameter generating means,calculates an adaptation parameter in the Nodes selected by the node selecting means,. Reference pattern generating means,produces an adapted reference pattern using the calculated adaptation parameter.

Speech recognition pattern adaptation system using tree scheme

The invention provides a standard pattern production system which produces an optimum recognition unit in terms of an information criterion to given learning data using an information criterion in learning of a standard pattern in pattern recognition. An input pattern production section holds an input pattern, and a standard pattern producing parameter production section calculates and outputs parameters necessary to produce standard patterns of individual categories. A cluster set production section divides a category set into cluster sets. A common standard pattern production section calculates standard patterns of individual clusters of the cluster sets. An optimum cluster selection section receives a plurality of cluster sets and common standard patterns and selects an optimum cluster using an information criterion. A standard pattern storage section stores the common standard pattern of the optimum cluster set as a standard pattern for the individual categories.

Standard pattern production system employing information criterion

A pattern adapting apparatus including an input pattern forming unit, a tree structure standard pattern storing unit for storing a tree structure standard pattern including a tree structure indicative of inclusive relationships among categories and a parameter set at each node of the tree structure, a pattern matching unit for matching categories of the tree structure standard pattern with input samples of an input pattern, a tree structure standard pattern modifying unit for modifying a tree structure standard pattern based on the results of pattern matching, a node set selecting unit for calculating a description length with respect to a plurality of node sets in a tree structure pattern to select an appropriate node set, a modified standard pattern forming unit for forming a modified standard pattern by using a parameter set of a selected node set, and a standard pattern for recognition storing unit for storing a modified standard pattern.

Pattern adapting apparatus using minimum description length criterion in

In a reference pattern adapting device for adapting reference pattern parameter groups (1-M) to adapted reference pattern parameter groups (1-M) by using training patterns (1-L) derived from a training pattern signal (TP). A similarity calculating unit (15) calculates a group of primary degrees of similarity between (a) each of M reference pattern element groups representative of reference patterns (output of a vector group memory 11) and (b) each of M reference pattern parameter groups (output of pattern parameter memory 12). A difference calculating unit (16) calculates a group of differences between reference pattern elements of each of the M reference pattern element groups and training pattern elements of each of L training pattern element groups representative of the training patterns (1-L). A first calculating unit (21) calculates a primary difference value by using the group of primary degrees of similarity and the group of differences. A second calculating unit (22) calculates a group of primary mean values by using each of L reference pattern parameter groups and the group of differences. The resulting group of primary mean values is output to an identifier (25) as one of L adapted pattern parameter groups.

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Tokyo, Japan

Koichi Shinoda