Mitsubishi Electric Corporation

Tokyo Electron Limited

Koichi Orito

Hitoshi Kato

Jun Sato

Hiroyuki Kikuchi

Kohei Fukushima

Toshiki Takahashi

Shingo Maku

A communication system includes a first device and a plurality of second devices, and each of the second devices includes a pairing processing unit, a device information storage unit, and a data control unit. The pairing processing unit performs a pairing process including an authentication process with the first device by using device-specific information of the second device. The device information storage unit stores device information including pairing authentication information. The pairing processing unit performs, by using device-specific information of another second device the pairing process between the first device and the another second device, and stores the pairing authentication information in the device information storage unit. The data control unit transmits the pairing authentication information to the another second device. The data control unit of the another second device stores the received pairing authentication information in the device information storage unit.

Communication system and device

A display includes: a monitor that includes an input/output region and performs haptic feedback when detecting an input from an operator while an image is displayed, the input/output region being obtained by superimposing a first region for displaying an image, a second region including a plurality of input detection regions each for detecting an input from an operator, and a third region including a plurality of haptic feedback regions each for performing haptic feedback to the operator; and a data processor that determines a haptic output value in each of the plurality of haptic feedback regions on the basis of image data of an image being displayed on the first region and a detection result of an input from an operator in each of the plurality of input detection regions.

Display

A display includes a calculation unit to calculate, when first and second events that occur in an external device are transmitted from the external device, operating time from when the first event is ended by operation for the first event to when the second event is ended by operation for the second event; a storage unit to store operating procedures that are histories of the operation for the second event and the associated operating times; and a display unit to display any of the operating procedures in the storage unit, according to instruction from the calculation unit. When the second event is newly transmitted after the calculation of the operating time is completed, the calculation unit selects an operating procedure used for operation guidance from among the operating procedures based on the operating times and causes the display unit to display the selected operating procedure, thereby executing the operation guidance.

Display, display method, and display system

A vertical plasma processing apparatus for a semiconductor process includes a process container having a process field configured to accommodate a plurality of target substrates at intervals in a vertical direction, and a marginal space out of the process field. In processing the target substrates, a control section simultaneously performs supply of a process gas to the process field from a process gas supply circuit and supply of a blocking gas to the marginal space from a blocking gas supply circuit to inhibit the process gas from flowing into the marginal space.

Vertical plasma processing method for forming silicon containing film

A CVD method is to form a silicon nitride film on a target substrate (W). The method includes heating the substrate (W) accommodated in a process container (), at a process temperature, and supplying a process gas including hexaethylamino-disilane gas and ammonia gas onto the substrate (W) heated at the process temperature, thereby depositing a silicon nitride film on the substrate (W).

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Tokyo, Japan

Koichi Orito